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市場調查報告書
商品編碼
1567306

極紫外線 (EUV)微影術市場:按類型、按技術、按應用、按地區

Extreme Ultraviolet Lithography Market, By Type, By Technology, By Application, By Geography

出版日期: | 出版商: Coherent Market Insights | 英文 180 Pages | 商品交期: 2-3個工作天內

價格
簡介目錄

預計2024年全球極紫外(EUV)微影術市場規模為94.2億美元,預計2031年將達287.6億美元,2024年至2031年複合年成長率為17.3%。

報告範圍 報告詳情
基準年 2023年 2024年市場規模 94.2億美元
實際資料 2019-2023 預測期 2024年至2031年
預測 2024-2031 年複合年成長率: 17.30% 2031年價值預測 287.6億美元
圖:2024 年按地區分類的極紫外線 (EUV)微影術市場佔有率(%)
極紫外光刻市場-IMG1

極紫外線 (EUV)微影術是一種先進的半導體製造技術,它使用電磁波頻譜EUV 區域的短波長光源來生產積體電路。 EUV微影術使用波長約 13.5 nm 的光在矽晶圓上形成微型積體電路。與光學微影相比,EUV微影術有可能提高列印更小節點所需的解析度,光學微影術使用 193 nm 左右的較短紫外線波長。隨著晶片設計不斷縮小,電晶體通道達到數十奈米,EUV微影術提供了一種可行的補充技術,使莫耳定律得以延續。隨著公司和研究聯盟的大量研究投資,EUV微影術正在商業性化大規模生產。

市場動態:

全球極紫外線(EUV)微影術市場的成長受到多種因素的推動,其中包括半導體裝置日益小型化,這需要先進的微影術技術來製造晶片。 EUV微影術可以生產小至 10 nm 或更小的積體電路,滿足下一代節點的解析度要求。半導體製造商增加投資以擴大晶圓產能和升級製造設備正在推動 EUV微影術設備的採用。然而,與 EUV微影術設備相關的高成本和複雜的功率需求可能會阻礙市場成長。此外,最近全球範圍內的氖氣等零件短缺也限制了向 EUV 技術的完全過渡。增加研究和開發以提高效率和解析度,以及擴大光掩模基礎設施,將為未來提供新的機會。

本研究的主要特點

本報告對全球極紫外(EUV)微影術市場進行了詳細分析,並給出了以2023年為基準年的預測期(2024-2031)的市場規模和復合年成長率。

它還強調了各個細分市場的潛在商機,並說明了該市場有吸引力的投資提案矩陣。

它還提供了有關市場促進因素、限制因素、機會、新產品發布和核准、市場趨勢、區域前景、主要企業採取的競爭策略等的主要考察。

根據公司亮點、產品系列、主要亮點、績效和策略等參數,對全球極紫外線 (EUV)微影術市場的主要公司進行概況分析。

調查的主要企業包括 ASML Holding NV、尼康公司、Canon Inc.、英特爾公司、三星電子有限公司、台積電(台灣積體電路製造公司)、GlobalFoundries、美光科技公司和應用材料公司。 Research Corporation、KLA Corporation、Tokyo Electron Ltd.、Advantest Ltd.、Hitachi High-Technologies Ltd.、Teradyne, Inc. 等。

該報告的見解使負責人和公司經營團隊能夠就未來的產品發布、升級、市場擴張和行銷策略做出明智的決策。

全球極紫外線 (EUV)微影術市場報告迎合了該行業的各個相關人員,如投資者、供應商、產品製造商、經銷商、新進業者和財務分析師。

相關人員可以透過分析全球極紫外線 (EUV)微影術市場時所使用的各種策略矩陣來促進決策。

目錄

第1章 研究目的與前提

  • 研究目的
  • 先決條件
  • 簡稱

第2章 市場展望

  • 報告說明
    • 市場定義和範圍
  • 執行摘要

第3章市場動態、法規及趨勢分析

  • 市場動態
    • 促進因素
    • 抑制因素
    • 市場機會
  • 監管場景
  • 產業動態
  • 併購
  • 新系統的引入/核准
  • COVID-19 大流行的影響

第 4 章 2019-2031 年全球極紫外線 (EUV)微影術市場(按類型)

  • 微影術設備
  • 光罩
  • 光源
  • 其他

第5章 全球極紫外線 (EUV)微影術市場(按技術)2019-2031

  • EUV微影術系統
  • 掩模/蝕刻技術
  • 其他

第6章2019-2031 年全球極紫外線 (EUV)微影術市場(依應用)

  • 半導體製造
  • 微電子學
  • 其他

第7章2019-2031年全球極紫外線(EUV)微影術市場(按地區)

  • 北美洲
  • 歐洲
  • 亞太地區
  • 拉丁美洲
  • 中東
  • 非洲

第8章 競爭格局

  • 公司簡介
    • ASML Holding NV
    • Nikon Corporation
    • Canon Inc.
    • Intel Corporation
    • Samsung Electronics Co., Ltd.
    • TSMC(Taiwan Semiconductor Manufacturing Company)
    • GlobalFoundries
    • Micron Technology, Inc.
    • Applied Materials, Inc.
    • Lam Research Corporation
    • KLA Corporation
    • Tokyo Electron Limited
    • Advantest Corporation
    • Hitachi High-Technologies Corporation
    • Teradyne, Inc.

第9章 分析師建議

第10章調查方法

  • 參考
  • 調查方法
簡介目錄
Product Code: CMI4537

Global extreme ultraviolet (EUV) lithography market is estimated to be valued at US$ 9.42 Bn in 2024 and is expected to reach US$ 28.76 Bn by 2031, exhibiting a compound annual growth rate (CAGR) of 17.3% from 2024 to 2031.

Report Coverage Report Details
Base Year: 2023 Market Size in 2024: US$ 9.42 Bn
Historical Data for: 2019 to 2023 Forecast Period: 2024 to 2031
Forecast Period 2024 to 2031 CAGR: 17.30% 2031 Value Projection: US$ 28.76 Bn
Figure. Extreme Ultraviolet (EUV) Lithography Market Share (%), By Region, 2024
Extreme Ultraviolet  Lithography Market - IMG1

Extreme ultraviolet (EUV) lithography is an advanced semiconductor manufacturing technology that uses short wavelength light sources in the EUV region of the electromagnetic spectrum for integrated circuit fabrication. It employs a radiation wavelength of approximately 13.5 nm to pattern microscopic integrated circuits on silicon wafers. Compared to optical lithography which uses shorter ultraviolet wavelengths around 193 nm, EUV lithography offers potential improved resolution required to print smaller nodes. As chip designs continue to shrink and transistor channels measure in the tens of nanometers, EUV lithography provides a viable complimentary technology to enable continued Moore's law. With significant R&D investments by companies and research consortiums, EUV lithography has been commercially deployed for high volume manufacturing.

Market Dynamics:

Global extreme ultraviolet (EUV) lithography market growth is driven by several factors such as ongoing miniaturization of semiconductor devices requiring advanced lithography techniques for chip fabrication. EUV lithography allows manufacturing of integrated circuits with feature sizes below 10 nm, meeting the resolution demands of next generation nodes. Growing investments by semiconductor manufacturers in expanding wafer capacities and upgrading fabrication facilities boosts adoption of EUV lithography equipment. However, high costs associated with EUV lithography tools and complex power source requirements can hamper the market growth. Further, recent global shortage of components like neon gas restricts complete shift to EUV technology. Increasing R&D to improve efficiency and resolution as well as expanding photomask infrastructure present new opportunities in the future.

Key features of the study:

This report provides in-depth analysis of the global extreme ultraviolet (EUV) lithography market, and provides market size (US$ Billion) and compound annual growth rate (CAGR%) for the forecast period (2024-2031), considering 2023 as the base year

It elucidates potential revenue opportunities across different segments and explains attractive investment proposition matrices for this market

This study also provides key insights about market drivers, restraints, opportunities, new product launches or approval, market trends, regional outlook, and competitive strategies adopted by key players.

It profiles key players in the global extreme ultraviolet (EUV) lithography market based on the following parameters - company highlights, products portfolio, key highlights, financial performance, and strategies.

Key companies covered as a part of this study include ASML Holding N.V., Nikon Corporation, Canon Inc., Intel Corporation, Samsung Electronics Co., Ltd., TSMC (Taiwan Semiconductor Manufacturing Company), GlobalFoundries, Micron Technology, Inc., Applied Materials, Inc., Lam Research Corporation, KLA Corporation, Tokyo Electron Limited, Advantest Corporation, Hitachi High-Technologies Corporation, and Teradyne, Inc.

Insights from this report would allow marketers and the management authorities of the companies to make informed decisions regarding their future product launches, type up-gradation, market expansion, and marketing tactics.

Global extreme ultraviolet (EUV) lithography market report caters to various stakeholders in this industry including investors, suppliers, product manufacturers, distributors, new entrants, and financial analysts

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the global extreme ultraviolet (EUV) lithography market

Detailed Segmentation-

  • Type Insights (Revenue, US$ Bn, 2019 - 2031)
    • Lithography Equipment
    • Photomasks
    • Light Sources
    • Others
  • Technology Insights (Revenue, US$ Bn, 2019 - 2031)
    • EUV Lithography System
    • Mask/Etch Technology
    • Others
  • Application Insights (Revenue, US$ Bn, 2019 - 2031)
    • Semiconductor Manufacturing
    • Microelectronics
    • Others
  • Regional Insights (Revenue, US$ Bn, 2019 - 2031)
    • North America
    • U.S.
    • Canada
    • Latin America
    • Brazil
    • Argentina
    • Mexico
    • Rest of Latin America
    • Europe
    • Germany
    • U.K.
    • Spain
    • France
    • Italy
    • Russia
    • Rest of Europe
    • Asia Pacific
    • China
    • India
    • Japan
    • Australia
    • South Korea
    • ASEAN
    • Rest of Asia Pacific
    • Middle East
    • GCC Countries
    • Israel
    • Rest of Middle East
    • Africa
    • South Africa
    • North Africa
    • Central Africa
  • Key Players Insights
    • ASML Holding N.V.
    • Nikon Corporation
    • Canon Inc.
    • Intel Corporation
    • Samsung Electronics Co., Ltd.
    • TSMC (Taiwan Semiconductor Manufacturing Company)
    • GlobalFoundries
    • Micron Technology, Inc.
    • Applied Materials, Inc.
    • Lam Research Corporation
    • KLA Corporation
    • Tokyo Electron Limited
    • Advantest Corporation
    • Hitachi High-Technologies Corporation
    • Teradyne, Inc.

Table of Contents

1. Research Objectives and Assumptions

  • Research Objectives
  • Assumptions
  • Abbreviations

2. Market Purview

  • Report Description
    • Market Definition and Scope
  • Executive Summary
    • Market Snippet, By Type
    • Market Snippet, By Technology
    • Market Snippet, By Application
    • Market Snippet, By Region

3. Market Dynamics, Regulations, and Trends Analysis

  • Market Dynamics
    • Drivers
    • Restraints
    • Market Opportunities
  • Regulatory Scenario
  • Industry Trend
  • Merger and Acquisitions
  • New System Launches/Approvals
  • Impact of COVID-19 Pandemic

4. Global Extreme Ultraviolet (EUV) Lithography Market, By Type, 2019-2031, (US$ Bn)

  • Introduction
    • Market Share Analysis, 2024 and 2031 (%)
    • Y-o-Y Growth Analysis, 2020-2031
    • Segment Trends
  • Lithography Equipment
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Photomasks
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Light Sources
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Others
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)

5. Global Extreme Ultraviolet (EUV) Lithography Market, By Technology, 2019-2031, (US$ Bn)

  • Introduction
    • Market Share Analysis, 2024 and 2031 (%)
    • Y-o-Y Growth Analysis, 2020-2031
    • Segment Trends
  • EUV Lithography System
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Mask/Etch Technology
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Others
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)

6. Global Extreme Ultraviolet (EUV) Lithography Market, By Application, 2019-2031, (US$ Bn)

  • Introduction
    • Market Share Analysis, 2024 and 2031 (%)
    • Y-o-Y Growth Analysis, 2020-2031
    • Segment Trends
  • Semiconductor Manufacturing
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Microelectronics
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)
  • Others
    • Introduction
    • Market Size and Forecast, 2019-2031, (US$ Bn)

7. Global Extreme Ultraviolet (EUV) Lithography Market, By Region, 2019-2031, (US$ Bn)

  • Introduction
    • Market Share Analysis, By Region, 2024 and 2031 (%)
    • Y-o-Y Growth Analysis, 2020-2031
  • North America
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • U.S.
      • Canada
  • Europe
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • Germany
      • U.K.
      • Spain
      • France
      • Italy
      • Russia
      • Rest of Europe
  • Asia Pacific
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • China
      • India
      • Japan
      • ASEAN
      • Australia
      • South Korea
      • Rest of Asia Pacific
  • Latin America
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • Brazil
      • Argentina
      • Mexico
      • Rest of Latin America
  • Middle East
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • Israel
      • GCC Countries
      • Rest of the Middle East
  • Africa
    • Regional Trends
    • Market Size and Forecast, By Type, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Technology, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Application, 2019-2031, (US$ Bn)
    • Market Size and Forecast, By Country, 2019-2031, (US$ Bn)
      • South Africa
      • North Africa
      • Central Africa

8. Competitive Landscape

  • Company Profiles
    • ASML Holding N.V.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Nikon Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Canon Inc.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Intel Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Samsung Electronics Co., Ltd.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • TSMC (Taiwan Semiconductor Manufacturing Company)
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • GlobalFoundries
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Micron Technology, Inc.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Applied Materials, Inc.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Lam Research Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • KLA Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Tokyo Electron Limited
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Advantest Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Hitachi High-Technologies Corporation
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates
    • Teradyne, Inc.
      • Company Overview
      • Product Portfolio
      • Financial Performance
      • Key Strategies
      • Recent Developments/Updates

9. Analyst Recommendations

  • Wheel of Fortune
  • Analyst View
  • Coherent Opportunity Map

10. Research Methodology

  • References
  • Research Methodology
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