市場調查報告書
商品編碼
1451759
2024-2032 年化學氣相沉積設備市場報告(按技術(等離子體增強 CVD、低壓 CVD、金屬有機 CVD、常壓 CVD 等)、應用、最終用戶和地區)Chemical Vapour Deposition Equipment Market Report by Technology (Plasma Enhanced CVD, Low Pressure CVD, Metal Organic CVD, Atmospheric Pressure CVD, and Others), Application, End User, and Region 2024-2032 |
2023年全球化學氣相沉積(CVD)設備市場規模達305億美元。展望未來, IMARC Group預計到2032年市場規模將達到583億美元,2024-2032年複合年成長率(CAGR)為7.25% 。電子產業的顯著成長、醫療應用中對 CVD 設備的需求不斷增加以及廣泛的研發 (R&D) 活動是推動市場的一些關鍵因素。
化學氣相沉積 (CVD) 系統用於利用氣態試劑和熱誘導化學反應將各種材料的薄膜沉積到基板上。該設備通常由反應室、氣體輸送系統、能源、真空系統、加熱系統和排氣系統組成。 CVD 設備廣泛應用於塗料和半導體產業,以製造用於生產太陽能板、發光二極體和積體電路 (IC) 的材料。該設備可生產高品質、均勻的薄膜,具有出色的薄膜純度、厚度、成分和微觀結構控制。 CVD 設備是一種強大的工具,具有多功能性、低溫沉積、高生產率和低廢物產生等特性。因此,它在電子、塗料和催化行業中得到了廣泛的應用。
全球電子產業廣泛採用產品是推動市場成長的關鍵因素之一。 CVD設備廣泛應用於先進電子導體和絕緣體以及相關結構的設計和加工,例如擴散阻擋層和高導熱基板(散熱器)。與此一致的是,對微晶片、電晶體和感測器等微電子元件的需求不斷成長,有利於市場成長。此外,平板顯示器、筆記型電腦、儲存設備、手機和其他電子產品生產中對 CVD 設備的需求不斷成長,也是另一個推動成長的因素。除此之外,引入等離子體增強CVD(PECVD)技術在較低的基板溫度下沉積材料有助於減少基板上的熱應力,並允許使用溫度敏感材料,這反過來又提供了推動力到市場成長。此外,太陽能電池製造中廣泛應用的設備的廣泛使用,例如晶體矽太陽能電池中的晶體矽沉積到高性能薄膜太陽能電池中的各種材料的沉積,正在推動市場成長。此外,多室 CVD 設備的推出有助於在單一製程中沉積多種材料,有助於提高效率並減少製造時間,從而為市場創造積極的前景。其他因素,包括醫療應用中對 CVD 設備的需求不斷增加、廣泛的研發 (R&D) 活動、各行業對塗料的需求不斷增加,以及鼓勵國內製造的各種政府舉措的實施,預計將推動市場成長。
The global chemical vapour deposition (CVD) equipment market size reached US$ 30.5 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 58.3 Billion by 2032, exhibiting a growth rate (CAGR) of 7.25% during 2024-2032. Significant growth in the electronics industry, the increasing demand for CVD equipment in medical applications, and extensive research and development (R&D) activities represent some of the key factors driving the market.
A chemical vapor deposition (CVD) system is used to deposit thin films of various materials onto a substrate using gaseous reagents and thermally induced chemical reactions. The equipment typically consists of a reaction chamber, gas delivery system, energy source, vacuum system, heating system, and exhaust system. CVD equipment is widely used in the coatings and semiconductor industry to make materials that are used to produce solar panels, light-emitting diodes, and integrated circuits (ICs). The equipment produces high-quality, uniform films with excellent film purity, thickness, composition, and microstructure control. CVD equipment is a powerful tool that exhibits versatility, low-temperature deposition, high production rates, and low waste generation. As a result, it finds extensive applications across the electronics, coatings, and catalysis industries.
The widespread product adoption in the electronics industry across the globe is one of the key factors driving the market growth. CVD equipment is widely used in the designing and processing of advanced electronic conductors and insulators, as well as related structures, such as diffusion barriers and high thermal conductivity substrates (heat sinks). In line with this, the increasing demand for microelectronic components such as microchips, transistors, and sensors are favoring the market growth. Moreover, the rising demand for CVD equipment in the production of flat panel displays, laptops, storage devices, mobile phones, and other electronic items is acting as another growth-inducing factor. Apart from this, the introduction of the plasma-enhanced CVD (PECVD) technique to deposit materials at lower substrate temperatures helps to reduce the thermal stress on the substrate and allows for the use of temperature-sensitive materials, which in turn is providing an impetus to the market growth. Additionally, the widespread equipment utilization for a wide range of applications in solar cell manufacture, such as crystalline silicon deposition in crystalline-silicon solar cells to the deposition of a variety of materials in thin high-performance film solar cells, is propelling the market growth. Furthermore, the launch of multi-chamber CVD equipment, which helps in the deposition of multiple materials in a single process that assists in increasing efficiency and reducing manufacturing time, which in turn is creating a positive outlook for the market. Other factors, including the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities, rising demand for coatings in various industries, and the implementation of various government initiatives to encourage domestic manufacturing, are anticipated to drive the market growth.
IMARC Group provides an analysis of the key trends in each segment of the global chemical vapour deposition (CVD) equipment market, along with forecasts at the global, regional, and country levels from 2024-2032. Our report has categorized the market based on technology, application, and end user.
Plasma Enhanced CVD (PECVD)
Low Pressure CVD (LPCVD)
Metal Organic CVD (MOCVD)
Atmospheric Pressure CVD (APCVD)
Others
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the technology. This includes plasma enhanced CVD (PECVD), low pressure CVD (LPCVD), metal organic CVD (MOCVD), atmospheric pressure CVD (APCVD) and others. According to the report, low pressure CVD (LPCVD) represented the largest segment.
Coatings
Electronics
Catalysis
Others
A detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the application has also been provided in the report. This includes coatings, electronics, catalysis, and others. According to the report, electronics accounted for the largest market share.
Memory
Foundry
IDM
Logic
The report has provided a detailed breakup and analysis of the chemical vapour deposition (CVD) equipment market based on the end user. This includes memory, foundry, IDM, and logic. According to the report, foundry represented the largest segment.
North America
United States
Canada
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Asia Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The report has also provided a comprehensive analysis of all the major regional markets, which include North America (the United States and Canada); Europe (Germany, France, the United Kingdom, Italy, Spain, Russia, and others); Asia Pacific (China, Japan, India, South Korea, Australia, Indonesia, and others); Latin America (Brazil, Mexico, and others); and the Middle East and Africa. According to the report, Asia Pacific was the largest market for chemical vapour deposition (CVD) equipment. Some of the factors driving the Asia Pacific chemical vapour deposition (CVD) equipment market included the increasing demand for CVD equipment in medical applications, extensive research and development (R&D) activities and rapid technological advancements.
The report has also provided a comprehensive analysis of the competitive landscape in the global chemical vapour deposition (CVD) equipment market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Aixtron SE, Applied Materials Inc., CVD Equipment Corporation, IHI Corporation, Jusung Engineering Co. Ltd., Lam Research Corporation, Oxford Instruments plc, Plasma-Therm LLC, ULVAC Inc., Veeco Instruments Inc., etc. Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.
Kindly note that this only represents a partial list of companies, and the complete list has been provided in the report.