市場調查報告書
商品編碼
1468351
原子層沉積設備市場報告(按產品(金屬 ALD、氧化鋁 ALD、等離子體增強 ALD、催化 ALD 等)、應用(半導體、太陽能設備、電子、醫療設備等)和地區 2024-2032Atomic Layer Deposition Equipment Market Report by Product (Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Others), Application (Semiconductors, Solar Devices, Electronics, Medical Equipment, and Others), and Region 2024-2032 |
IMARC Group年全球原子層沉積設備市場規模達66億美元。
原子層沉積 (ALD) 是一種氣相技術,用於在暴露於交替前體後在基底頂部沉積超薄膜。一些常用設備包括單晶圓、批量、等離子體、大型基板 ALD 反應器、薄膜電致發光 (TFEL) 顯示器和其他電子元件。這些工具透過控制厚度並改善或修改基材的各種特性(包括電阻、電導率和強度)來幫助確保均勻性。由於這些特性,它被用於半導體、電子、光學元件、燃料電池和熱電材料。目前,商用原子層沉積設備有多種類型,例如金屬、等離子體增強、氧化鋁和催化。
由於對靈活工具的需求不斷增加以改善功能並提供更高的精度,ALD 設備在各種研發 (R&D) 設施、醫療保健和太陽能領域得到廣泛採用,這主要推動了市場的成長。與此一致的是,用於沉積各種產品(包括資料儲存、小型電子元件和顯示設備)的電子材料中對小型化、半導體和電源管理系統的需求不斷成長,進一步推動了市場的成長。利用原子層沉積設備製造積體電路 (IC)、晶片和微機電系統 (MEMS) 產品(例如光開關、感測器和電腦)進一步支援了這一點。與此一致的是,重大技術進步導致軟性電子元件和3D (3D) 列印反應器引入空間 ALD,以確保複雜 3D 奈米結構的均勻性和一致性,這是另一個生長誘導因素。此外,由於植入式、智慧手錶、智慧型手機和醫療設備的使用不斷增加,對固態薄膜電池的需求不斷增加,也促進了市場的成長。除此之外,主要參與者之間針對推出等離子體增強 ALD 的策略合作正在為市場創造積極的前景。
The global atomic layer deposition equipment market size reached US$ 6.6 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 22.6 Billion by 2032, exhibiting a growth rate (CAGR) of 14.5% during 2024-2032.
Atomic layer deposition (ALD) refers to a vapor phase technique that is deployed for depositing ultra-thin films on top of a substrate after getting exposed to alternating precursors. Some of the commonly used equipment includes single wafer, batch, plasma, large substrate ALD reactors, thin-film electroluminescent (TFEL) displays and other electronic components. These tools help in ensuring uniformity by controlling the thickness and improving or modifying various properties of substrates, including resistance, conductivity, and strength. On account of these properties, it is used in semiconductors, electronics, optical devices, fuel cells and thermoelectric materials. At present, atomic layer deposition equipment is commercially available in varying types, such as metal, plasma-enhanced, aluminum oxide, and catalytic.
The widespread adoption of ALD equipment across various research and development (R&D) facilities, healthcare, and solar sector on account of the increasing need for flexible tools to improve functionality and offer higher accuracy is primarily driving the market growth. In line with this, the rising demand for miniaturization, semiconductors, and power management systems in electronic materials for depositing various products, including data storage, small electronic components and display devices are further contributing to the market growth. This is further supported by the utilization of atomic layer deposition equipment for manufacturing integrated circuits (IC), chips, and micro-electromechanical systems (MEMS) products, such as optical switches, sensors, and computers. In line with this, significant technological advancements have led to the introduction of spatial ALD for flexible electronics and three-dimensional (3D) printed reactors to ensure uniformity and conformity of complex 3D nanostructures, which is acting as another growth-inducing factor. Additionally, the escalating requirement for solid-state thin-film batteries due to the increasing uptake of implantable, smartwatches, smartphones and medical equipment is contributing to the market growth. Apart from this, strategic collaborations amongst key players for launching plasma-enhanced ALD are creating a positive outlook for the market.
IMARC Group provides an analysis of the key trends in each sub-segment of the global atomic layer deposition equipment market report, along with forecasts at the global, regional and country level from 2024-2032. Our report has categorized the market based on product and application.
Metal ALD
Aluminum Oxide ALD
Plasma Enhanced ALD
Catalytic ALD
Others
Semiconductors
Solar Devices
Electronics
Medical Equipment
Others
North America
United States
Canada
Asia-Pacific
China
Japan
India
South Korea
Australia
Indonesia
Others
Europe
Germany
France
United Kingdom
Italy
Spain
Russia
Others
Latin America
Brazil
Mexico
Others
Middle East and Africa
The competitive landscape of the industry has also been examined along with the profiles of the key players being Arradiance LLC, ASM International, Beneq Oy, CVD Equipment Corporation, Forge Nano Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments plc, Picosun Oy (Applied Materials Inc.), SENTECH Instruments GmbH, Veeco Instruments Inc., Wonik IPS Co. Ltd. and Tokyo Electron Limited.