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半導體生產設備半導體材料

市場調查報告書

商品編碼

1542523

全球高 k 和 CVD ALD 金屬前驅物市場研究報告 - 2024 年至 2032 年產業分析、規模、佔有率、成長、趨勢和預測

Global High-k And CVD ALD Metal Precursors Market Research Report - Industry Analysis, Size, Share, Growth, Trends and Forecast 2024 to 2032

出版日期: 2024年07月01日 | 出版商:

Value Market Research | 英文 123 Pages | 商品交期: 最快1-2個工作天內

價格

簡介目錄圖表

全球高 k 和 CVD ALD 金屬前驅體市場需求預計將從 2023 年的 5.8433 億美元達到近 10.7246 億美元的市場規模，2024-2032 年研究期間複合年成長率為 6.98%。

高 k 和 CVD/ALD 金屬前驅體用於半導體工業中電晶體、儲存單元和電容器等半導體裝置的製造。高 k 材料是具有高介電常數 (k) 的介電材料，介電常數是衡量其儲存電荷能力的指標。高 k 材料用於製造先進的半導體裝置，以降低功耗、提高處理速度並提高裝置的性能。 CVD（化學氣相沉積）和 ALD（原子層沉積）是半導體產業中用於在基板上沉積金屬或金屬氧化物薄膜的兩種常用技術。 CVD 是一種氣相前驅體在基材表面反應形成固體薄膜的工藝，而 ALD 是一種透過將基材表面暴露於交替的前驅體脈衝來沉積材料薄膜的技術。金屬前驅物用於 CVD/ALD 製程中沉積金屬薄膜並在半導體裝置中形成金屬接觸。這些前驅體通常是金屬有機化合物，可以蒸發並輸送到基材表面，在基材表面上反應形成所需的金屬或金屬氧化物薄膜。高k和CVD/ALD金屬前驅物的例子包括鉿和鋯前體，例如四(乙基甲基氨基)鉿(TEMAHf)和四(乙基甲基氨基)鋯(TEMAZr)，以及鈦前體，例如四(二甲基氨基)鈦(TDMAT) 。這些前驅體是先進半導體裝置製造的關鍵成分，其品質和純度對於實現高裝置性能和良率非常重要。

市場動態

對邏輯和儲存晶片等高效能和低功耗半導體裝置的需求不斷成長，正在推動高 k 和 CVD/ALD 金屬前驅市場的成長。這些材料對於製造需要複雜結構、高整合密度和降低功耗的先進裝置至關重要。半導體技術的不斷進步，例如 5G、人工智慧 (AI) 和物聯網 (IoT) 的發展，正在推動高 k 和 CVD/ALD 金屬前驅體的需求。這些材料有助於開發更先進、更複雜的半導體元件，這些元件可以處理更高的資料速率和處理能力。半導體產業競爭激烈，各公司在研發方面投入巨資，以開發新的和改進的半導體裝置。高 k 和 CVD/ALD 金屬前驅體是這些裝置開發中必不可少的材料，研發投資的增加正在推動這些材料的需求。新興經濟體對消費性電子產品不斷成長的需求正在擴大高 k 和 CVD/ALD 金屬前驅體的市場需求。新興經濟體中可支配收入的增加和這些設備的日益普及預計將在未來幾年推動對這些材料的需求。半導體產業受到嚴格的環境法規的約束，公司面臨著減少環境足跡的壓力。與傳統沉積材料（例如含有有毒或有害化學物質的金屬有機前驅體）相比，高 k 和 CVD/ALD 金屬前驅體被認為是環保的。

研究報告涵蓋波特五力模型、市場吸引力分析和價值鏈分析。這些工具有助於清晰地了解行業結構並評估全球範圍內的競爭吸引力。此外，這些工具還對全球高 k 和 CVD ALD 金屬前驅物市場的各個細分市場進行了包容性評估。高 k 和 CVD ALD 金屬前驅體產業的成長和趨勢為本研究提供了整體方法。

市場區隔

高 k 和 CVD ALD 金屬前驅市場報告的這一部分提供了國家和地區層面細分市場的詳細資料，從而幫助策略師確定相應產品或服務的目標人群以及即將到來的機會。

依技術

互連
電容器
蓋茲

區域分析

本節涵蓋區域前景，重點介紹北美、歐洲、亞太地區、拉丁美洲以及中東和非洲的高 k 和 CVD ALD 金屬前體市場當前和未來的需求。此外，該報告重點關注所有主要地區各個應用領域的需求、估計和預測。

該研究報告還涵蓋了市場主要參與者的全面概況以及對全球競爭格局的深入了解。 High-k 和CVD ALD 金屬前驅體市場的主要參與者包括液化空氣集團、空氣化學產品公司、普萊克斯、林德、陶氏化學、Tri Chemical Laboratories Inc.、三星、Strem Chemicals Inc.、Colnatec、 Merck KGAA。本節包含競爭格局的整體視圖，包括各種策略發展，例如關鍵併購、未來產能、合作夥伴關係、財務概況、合作、新產品開發、新產品發布和其他發展。

如果您有任何客製化要求，請寫信給我們。我們的研究團隊可以根據您的需求提供客製化報告。

區域展望
介紹
北美銷售分析
- 概覽、歷史與預測資料銷售分析
- 北美按細分市場銷售分析
- 北美按國家銷售分析
- 美國銷售分析
- 加拿大銷售分析
- 墨西哥銷售分析
歐洲銷售分析
- 概覽、歷史與預測資料銷售分析
- 歐洲按細分市場銷售分析
- 歐洲按國家銷售分析
- 英國銷售分析
- 法國銷售分析
- 德國銷售分析
- 義大利銷售分析
- 俄羅斯銷售分析
- 歐洲其他地區銷售分析
亞太地區銷售分析
- 概覽、歷史與預測資料銷售分析
- 亞太地區按細分市場銷售分析
- 亞太地區按國家銷售分析
- 中國銷售分析
- 印度銷售分析
- 日本銷售分析
- 韓國銷售分析
- 澳洲銷售分析
- 東南亞銷售分析
- 亞太地區其他地區銷售分析
拉丁美洲銷售分析
- 概覽、歷史與預測資料銷售分析
- 拉丁美洲按細分市場銷售分析
- 拉丁美洲按國家銷售分析
- 巴西銷售分析
- 阿根廷銷售分析
- 秘魯銷售分析
- 智利銷售分析
- 拉丁美洲其他地區銷售分析
中東和非洲銷售分析
- 概覽、歷史與預測資料銷售分析
- 中東和非洲按細分市場銷售分析
- 中東和非洲按國家銷售分析
- 沙烏地阿拉伯銷售分析
- 阿拉伯聯合大公國銷售分析
- 以色列銷售分析
- 南非銷售分析
- 中東其他地區和非洲銷售分析

第 7 章：HIGH-K 和 CVD ALD 金屬前驅公司的競爭格局

High-k 和 CVD ALD 金屬前驅體市場競爭
夥伴關係/協作/協議
併購
新產品發布
其他發展

第 8 章：公司簡介

頂級公司市佔率分析
市場集中度
Air Liquide

公司概況
公司收入
產品
最新動態

Air Products & Chemicals Inc.

公司概況
公司收入
產品
最新動態

Praxair

公司概況
公司收入
產品
最新動態

Linde

公司概況
公司收入
產品
最新動態

Dow Chemical

公司概況
公司收入
產品
最新動態

Tri Chemical Laboratories Inc.

公司概況
公司收入
產品
最新動態

Samsung

公司概況
公司收入
產品
最新動態

Strem Chemicals Inc.

公司概況
公司收入
產品
最新動態

Colnatec

公司概況
公司收入
產品
最新動態

Merck KGAA

公司概況
公司收入
產品
最新動態

註 - 在公司概況中，財務詳細資訊和最新發展視情況而定，或對私人公司而言可能不包括在內

簡介目錄圖表

Product Code: VMR112110657

The global demand for High-k And CVD ALD Metal Precursors Market is presumed to reach the market size of nearly USD 1072.46 Million by 2032 from USD 584.33 Million in 2023 with a CAGR of 6.98% under the study period 2024-2032.

High-k and CVD/ALD metal precursors are used in the fabrication of semiconductor devices, such as transistors, memory cells, and capacitors, in the semiconductor industry. High-k materials are dielectric materials with a high dielectric constant (k), which is a measure of their ability to store electric charge. High-k materials are used in the fabrication of advanced semiconductor devices to reduce power consumption, increase processing speed, and improve the performance of the devices. CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) are two common techniques used for depositing thin films of metal or metal oxide on a substrate in the semiconductor industry. CVD is a process where a gas phase precursor reacts on the substrate surface to form a solid film, while ALD is a technique that deposits a thin film of a material by exposing the substrate surface to alternating pulses of precursors. Metal precursors are used in CVD/ALD processes to deposit metallic films and to create metallic contacts in semiconductor devices. These precursors are typically metal-organic compounds that can be vaporized and transported to the substrate surface where they react to form the desired metal or metal oxide film. Examples of high-k and CVD/ALD metal precursors include hafnium and zirconium precursors, such as tetrakis(ethylmethylamino)hafnium (TEMAHf) and tetrakis(ethylmethylamino)zirconium (TEMAZr), and titanium precursors such as tetrakis(dimethylamido)titanium (TDMAT). These precursors are critical components in the manufacturing of advanced semiconductor devices, and their quality and purity are important for achieving high device performance and yield.

MARKET DYNAMICS

The increasing demand for high-performance and low-power semiconductor devices, such as logic and memory chips, is driving the High-k and CVD/ALD Metal Precursors market growth. These materials are critical for the fabrication of advanced devices that require complex structures, high integration density, and reduced power consumption. The ongoing advancements in semiconductor technology, such as the development of 5G, artificial intelligence (AI), and the Internet of Things (IoT), are driving the High-k and CVD/ALD Metal Precursors demand. These materials enable the development of more advanced and complex semiconductor devices that can handle higher data rates and processing power. The semiconductor industry is highly competitive, and companies are investing heavily in R&D to develop new and improved semiconductor devices. High-k and CVD/ALD Metal Precursors are essential materials in the development of these devices, and the increasing investment in R&D is driving the demand for these materials. The growing demand for consumer electronics in emerging economies is scaling up the High-k and CVD/ALD Metal Precursors market demand. The rising disposable income and increasing penetration of these devices in emerging economies are expected to drive the demand for these materials in the coming years. The semiconductor industry is subject to stringent environmental regulations, and companies are under pressure to reduce their environmental footprint. High-k and CVD/ALD Metal Precursors are considered environmentally friendly compared to traditional deposition materials, such as metal-organic precursors, which contain toxic or hazardous chemicals.

The research report covers Porter's Five Forces Model, Market Attractiveness Analysis, and Value Chain analysis. These tools help to get a clear picture of the industry's structure and evaluate the competition attractiveness at a global level. Additionally, these tools also give an inclusive assessment of each segment in the global market of High-k And CVD ALD Metal Precursors. The growth and trends of High-k And CVD ALD Metal Precursors industry provide a holistic approach to this study.

MARKET SEGMENTATION

This section of the High-k And CVD ALD Metal Precursors market report provides detailed data on the segments at country and regional level, thereby assisting the strategist in identifying the target demographics for the respective product or services with the upcoming opportunities.

By Technology

Interconnect
Capacitors
Gates

REGIONAL ANALYSIS

This section covers the regional outlook, which accentuates current and future demand for the High-k And CVD ALD Metal Precursors market across North America, Europe, Asia-Pacific, Latin America, and Middle East & Africa. Further, the report focuses on demand, estimation, and forecast for individual application segments across all the prominent regions.

The research report also covers the comprehensive profiles of the key players in the market and an in-depth view of the competitive landscape worldwide. The major players in the High-k And CVD ALD Metal Precursors market include Air Liquide, Air Products & Chemicals Inc., Praxair, Linde, Dow Chemical, Tri Chemical Laboratories Inc., Samsung, Strem Chemicals Inc., Colnatec, Merck KGAA. This section consists of a holistic view of the competitive landscape that includes various strategic developments such as key mergers & acquisitions, future capacities, partnerships, financial overviews, collaborations, new product developments, new product launches, and other developments.

In case you have any custom requirements, do write to us. Our research team can offer a customized report as per your need.

1. PREFACE

1.1. Report Description
- 1.1.1 Objective
- 1.1.2 Target Audience
- 1.1.3 Unique Selling Proposition (USP) & offerings
1.2. Research Scope
1.3. Research Methodology
- 1.3.1 Market Research Process
- 1.3.2 Market Research Methodology

2. EXECUTIVE SUMMARY

2.1. Highlights of Market
2.2. Global Market Snapshot

3. HIGH-K AND CVD ALD METAL PRECURSORS - INDUSTRY ANALYSIS

3.1. Introduction - Market Dynamics
3.2. Market Drivers
3.3. Market Restraints
3.4. Opportunities
3.5. Industry Trends
3.6. Porter's Five Force Analysis
3.7. Market Attractiveness Analysis
- 3.7.1 Market Attractiveness Analysis By Technology
- 3.7.2 Market Attractiveness Analysis By Region

4. VALUE CHAIN ANALYSIS

4.1. Value Chain Analysis
4.2. Raw Material Analysis
- 4.2.1 List of Raw Materials
- 4.2.2 Raw Material Manufactures List
- 4.2.3 Price Trend of Key Raw Materials
4.3. List of Potential Buyers
4.4. Marketing Channel
- 4.4.1 Direct Marketing
- 4.4.2 Indirect Marketing
- 4.4.3 Marketing Channel Development Trend

5. GLOBAL HIGH-K AND CVD ALD METAL PRECURSORS MARKET ANALYSIS BY TECHNOLOGY

5.1. Overview By Technology
5.2. Historical and Forecast Data Analysis By Technology
5.3. Interconnect Historic and Forecast Sales By Regions
5.4. Capacitors Historic and Forecast Sales By Regions
5.5. Gates Historic and Forecast Sales By Regions

6. GLOBAL HIGH-K AND CVD ALD METAL PRECURSORS MARKET ANALYSIS BY GEOGRAPHY

6.1. Regional Outlook
6.2. Introduction
6.3. North America Sales Analysis
- 6.3.1 Overview, Historic and Forecast Data Sales Analysis
- 6.3.2 North America By Segment Sales Analysis
- 6.3.3 North America By Country Sales Analysis
- 6.3.4 United States Sales Analysis
- 6.3.5 Canada Sales Analysis
- 6.3.6 Mexico Sales Analysis
6.4. Europe Sales Analysis
- 6.4.1 Overview, Historic and Forecast Data Sales Analysis
- 6.4.2 Europe By Segment Sales Analysis
- 6.4.3 Europe By Country Sales Analysis
- 6.4.4 United Kingdom Sales Analysis
- 6.4.5 France Sales Analysis
- 6.4.6 Germany Sales Analysis
- 6.4.7 Italy Sales Analysis
- 6.4.8 Russia Sales Analysis
- 6.4.9 Rest Of Europe Sales Analysis
6.5. Asia Pacific Sales Analysis
- 6.5.1 Overview, Historic and Forecast Data Sales Analysis
- 6.5.2 Asia Pacific By Segment Sales Analysis
- 6.5.3 Asia Pacific By Country Sales Analysis
- 6.5.4 China Sales Analysis
- 6.5.5 India Sales Analysis
- 6.5.6 Japan Sales Analysis
- 6.5.7 South Korea Sales Analysis
- 6.5.8 Australia Sales Analysis
- 6.5.9 South East Asia Sales Analysis
- 6.5.10 Rest Of Asia Pacific Sales Analysis
6.6. Latin America Sales Analysis
- 6.6.1 Overview, Historic and Forecast Data Sales Analysis
- 6.6.2 Latin America By Segment Sales Analysis
- 6.6.3 Latin America By Country Sales Analysis
- 6.6.4 Brazil Sales Analysis
- 6.6.5 Argentina Sales Analysis
- 6.6.6 Peru Sales Analysis
- 6.6.7 Chile Sales Analysis
- 6.6.8 Rest of Latin America Sales Analysis
6.7. Middle East & Africa Sales Analysis
- 6.7.1 Overview, Historic and Forecast Data Sales Analysis
- 6.7.2 Middle East & Africa By Segment Sales Analysis
- 6.7.3 Middle East & Africa By Country Sales Analysis
- 6.7.4 Saudi Arabia Sales Analysis
- 6.7.5 UAE Sales Analysis
- 6.7.6 Israel Sales Analysis
- 6.7.7 South Africa Sales Analysis
- 6.7.8 Rest Of Middle East And Africa Sales Analysis

7. COMPETITIVE LANDSCAPE OF THE HIGH-K AND CVD ALD METAL PRECURSORS COMPANIES

7.1. High-k And CVD ALD Metal Precursors Market Competition
7.2. Partnership/Collaboration/Agreement
7.3. Merger And Acquisitions
7.4. New Product Launch
7.5. Other Developments

8. COMPANY PROFILES OF HIGH-K AND CVD ALD METAL PRECURSORS INDUSTRY

8.1. Top Companies Market Share Analysis
8.2. Market Concentration Rate
8.3. Air Liquide
- 8.3.1 Company Overview
- 8.3.2 Company Revenue
- 8.3.3 Products
- 8.3.4 Recent Developments
8.4. Air Products & Chemicals Inc.
- 8.4.1 Company Overview
- 8.4.2 Company Revenue
- 8.4.3 Products
- 8.4.4 Recent Developments
8.5. Praxair
- 8.5.1 Company Overview
- 8.5.2 Company Revenue
- 8.5.3 Products
- 8.5.4 Recent Developments
8.6. Linde
- 8.6.1 Company Overview
- 8.6.2 Company Revenue
- 8.6.3 Products
- 8.6.4 Recent Developments
8.7. Dow Chemical
- 8.7.1 Company Overview
- 8.7.2 Company Revenue
- 8.7.3 Products
- 8.7.4 Recent Developments
8.8. Tri Chemical Laboratories Inc.
- 8.8.1 Company Overview
- 8.8.2 Company Revenue
- 8.8.3 Products
- 8.8.4 Recent Developments
8.9. Samsung
- 8.9.1 Company Overview
- 8.9.2 Company Revenue
- 8.9.3 Products
- 8.9.4 Recent Developments
8.10. Strem Chemicals Inc.
- 8.10.1 Company Overview
- 8.10.2 Company Revenue
- 8.10.3 Products
- 8.10.4 Recent Developments
8.11. Colnatec
- 8.11.1 Company Overview
- 8.11.2 Company Revenue
- 8.11.3 Products
- 8.11.4 Recent Developments
8.12. Merck KGAA
- 8.12.1 Company Overview
- 8.12.2 Company Revenue
- 8.12.3 Products
- 8.12.4 Recent Developments