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全球EUV光刻機市場 - 2023-2030年
市場調查報告書
商品編碼
1290393

全球EUV光刻機市場 - 2023-2030年

Global EUV Lithography Market - 2023-2030
出版日期: | 出版商: DataM Intelligence | 英文 182 Pages | 商品交期: 最快1-2個工作天內

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簡介目錄

市場概況

全球EUV光刻市場規模在2022年達到57.1億美元，預計到2030年將達到291.4億美元，在2023-2030年的預測期內，年復合成長率為22.6%。

全球EUV光刻市場正經歷著快速的市場成長，技術進步、擴大採用存儲器和邏輯設備、合作和夥伴關係、人工智慧和機器學習的整合，以及地理擴張戰略等因素的推動下。上述市場趨勢正在重塑半導體製造業的格局，推動了更多市場機會的發展，以及先進和高效的光刻工藝。隨著行業的不斷發展，那些領先於這些趨勢並抓住新興市場機會的企業將從EUV光刻市場的成長和轉型中獲益。

全球EUV光刻市場正在見證全球範圍內半導體需求的激增，這是由於雷射生產的等離子體EUV光刻領域的顯著擴張，預計將在應用部分中佔據超過三分之一的市場佔有率。同樣，北美成為一個主導地區，佔市場佔有率的五分之二以上。

市場動態

技術進步和支持性政府政策

EUV光刻技術的不斷進步在推動市場成長方面發揮了舉足輕重的作用。世界各國政府已經認知到投資於研究和開發以提高光刻系統的重要性。世界各國政府已經認知到培育半導體行業的重要性，並實施了支持其發展的政策。例如，統計數據顯示，政府提供了稅收優惠、補助和補貼，以鼓勵研究、創新和國內半導體製造商採用EUV光刻技術。因此，技術的進步和政府的支持政策是全球EUV光刻技術市場需求和市場機會的主要驅動力。

監管和安全問題，產量的挑戰和可靠性

由於極端紫外線輻射的危險性，EUV光刻技術的使用必須遵守嚴格的安全協議。全球各國政府都有嚴格的規定和準則，以確保工人和環境的安全。遵守這些法規需要對安全措施、員工培訓和監測系統進行額外投資，從而阻礙了市場的成長。官方報告顯示，遵守法規在EUV光刻行業的整體營運成本中佔了很大一部分。

此外，EUV光刻技術的實施為實現高產量帶來了新的挑戰。該技術對掩膜和光源的微小缺陷的敏感性促使了製造過程中的產量損失。業界正在努力提高可靠性和良品率，以滿足半導體製造商的嚴格要求，但這仍然是一個持續的挑戰。提高產量的計劃需要大量的研發投資，推高了製造商的整體成本。

目錄

第一章：方法和範圍

  • 研究方法
  • 報告的研究目標和範圍

第二章：定義和概述

第三章：執行摘要

  • 按光源分析
  • 按應用分類
  • 按設備分類
  • 按地區分類

第四章：動態變化

  • 影響因素
    • 驅動因素
      • 對微型化的需求不斷上升，對先進半導體設備的需求也隨之增加
      • 技術進步和政府的支持性政策
    • 限制因素
      • 技術的複雜性、高昂的成本和關鍵部件的有限可用性
      • 監管和安全問題，產量的挑戰和可靠性的問題
    • 機會
    • 影響分析

第五章：行業分析

  • 波特的五力分析
  • 供應鏈分析
  • 價格分析
  • 監管分析

第六章：COVID-19分析

  • 對COVID-19的分析
    • COVID之前的情況
    • COVID期間的情況
    • COVID之後的情況
  • COVID-19期間的定價動態
  • 需求-供應譜系
  • 大流行期間與市場有關的政府計劃
  • 製造商的戰略計劃
  • 結語

第七章：按光源分類

  • 雷射產生的等離子體(LPP)
  • 真空火花
  • 氣體放電

第8章：按應用分類

  • 整合設備製造商（IDM）
  • 鑄造廠

第九章：按設備分類

  • 光源
  • 鏡子
  • 面罩
  • 其他

第十章：按地區分類

  • 北美洲
    • 美國
    • 加拿大
    • 墨西哥
  • 歐洲
    • 德國
    • 英國
    • 法國
    • 義大利
    • 俄羅斯
    • 歐洲其他地區
  • 南美洲
    • 巴西
    • 阿根廷
    • 南美其他地區
  • 亞太地區
    • 中國
    • 印度
    • 日本
    • 澳大利亞
    • 亞太其他地區
  • 中東和非洲

第11章：競爭格局

  • 競爭格局
  • 市場定位/佔有率分析
  • 合併和收購分析

第十二章：公司簡介

  • ASML
    • 公司概述
    • 產品組合和描述
    • 財務概況
    • 主要發展情況
  • Canon Inc.
  • Intel Corporation
  • Nikon Corporation
  • NuFlare Technology Inc.
  • Samsung Corporation
  • SUSS Microtec AG
  • Taiwan Semiconductor Manufacturing Company Limited (TSMC)
  • Ultratech Inc.
  • Vistec Semiconductor Systems

第十三章：附錄

簡介目錄
Product Code: ICT2136

Market Overview

The Global EUV Lithography Market size reached US$ 5.71 billion in 2022 and is expected to reach US$ 29.14 billion by 2030 growing at a CAGR of 22.6% during the forecast period 2023-2030.

The global EUV lithography market is experiencing rapid market growth, fueled by technological advancements, increasing adoption of memory and logic devices, collaborations and partnerships, the integration of AI and machine learning, and geographical expansion strategies. The aforementioned market trends are reshaping the semiconductor manufacturing landscape, driving the development of more market opportunities as well as advanced and efficient lithography processes. As the industry continues to evolve, businesses that stay ahead of these trends and seize emerging market opportunities stand to benefit from the growth and transformation of the EUV lithography market.

The global EUV lithography market is witnessing a surge in demand for semiconductors on a global scale due to significant expansion in the laser-produced plasma EUV lithography segment, which is anticipated to capture more than one-third of the market share within the application segment. Likewise, North America emerges as a dominant region, accounting for over two-fifths of the market share.

Market Dynamics

Technological Advancements and Supportive Government Policies

Continuous advancements in EUV lithography technology have played a pivotal role in driving market growth. Governments worldwide have acknowledged the importance of investing in research and development to enhance lithography systems. Governments worldwide have recognized the importance of nurturing the semiconductor industry and have implemented policies to support its development. For example, statistics reveal the provision of tax incentives, grants, and subsidies to encourage research, innovation, and the adoption of EUV lithography technology by domestic semiconductor manufacturers. Thus, technological advancements and supportive government policies act as major drivers for demand and market opportunities in the global EUV lithography market.

Regulatory and Safety Concerns, Yield Challenges and Reliability

The utilization of EUV lithography technology necessitates adherence to stringent safety protocols due to the hazardous nature of extreme ultraviolet radiation. Governments across the globe impose strict regulations and guidelines to ensure the safety of workers and the environment. Compliance with these regulations requires additional investments in safety measures, employee training, and monitoring systems, thereby impeding the market's growth. Official reports indicate that regulatory compliance accounts for a significant portion of the overall operational costs in the EUV lithography industry.

Furthermore, the implementation of EUV lithography introduces new challenges in achieving high production yields. The technology's sensitivity to minute defects in masks and light sources results in yield loss during the manufacturing process. The industry is striving to improve reliability and yield rates to meet the stringent requirements of semiconductor manufacturers, but it remains an ongoing challenge. Yield improvement initiatives require substantial investments in research and development, driving up the overall costs for manufacturers.

Segment Analysis

The global automotive oem coatings market is segmented based on light source, application, equipment and region.

Growing Semiconductor Demand, Advancement In Technology And Increase In Government Funding

The Laser Produced Plasma (LPP) segment has emerged as a critical component within the global EUV lithography market. By utilizing high-powered lasers, LPP technology generates extreme ultraviolet light, enabling the creation of more advanced semiconductor chips. Governmental statistics demonstrate the growing emphasis on LPP technology and its positive impact on the semiconductor industries of various countries.

The European Union (EU), for instance, has placed a strong emphasis on promoting advanced semiconductor manufacturing within its borders. In recent years, the EU has allocated significant funding to research projects focusing on LPP technology, aiming to strengthen its position in the global EUV lithography market. Furthermore, countries such as the U.S., Japan, South Korea, and Taiwan have also prioritized the advancement of LPP technology within their semiconductor industries.

Through strategic partnerships between governments, research institutions, and industry players, these nations have sought to enhance their competitiveness in the global market, fostering the growth of the LPP segment. As governments continue to support research and development in LPP technology and manufacturers drive further innovations, the LPP segment is poised for sustained growth. The aforementioned factors will play a pivotal role in advancing the semiconductor industry, enabling the production of smaller, more powerful, and more efficient electronic devices in the future.

Geographical Analysis

Governmental Support and Technological Advancements in North America

The North America region demonstrates a prominent presence in the global EUV lithography market, fueled by governmental support, technological advancements, and notable product launches. The U.S. and Canada, in particular, have witnessed positive growth in the semiconductor industry, leading to increased adoption of EUV lithography technology. For instance, Canada's semiconductor industry has experienced substantial growth in recent years, contributing to the North America region's EUV lithography market.

The Canadian government has actively supported the development of the semiconductor sector, emphasizing innovation and technological advancement. According to Statistics Canada, the manufacturing sales of electronic and electrical equipment, including semiconductors, increased by 8.5% in 2021, reflecting the industry's positive momentum. As the region continues to invest in research and development, it is expected to maintain its significant role in the global EUV lithography market, contributing to the advancement of the semiconductor industry as a whole.

Competitive Landscape

The major global players in the market include: ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc. and Vistec Semiconductor Systems.

Why Purchase the Report?

  • To visualize the global EUV lithography market segmentation based on light source, application, equipment and region, as well as understand key commercial assets and players.
  • Identify commercial opportunities by analyzing trends and co-development.
  • Excel data sheet with numerous data points of EUV lithography market-level with all segments.
  • PDF report consists of a comprehensive analysis after exhaustive qualitative interviews and an in-depth study.
  • Product mapping available as Excel consisting of key products of all the major players.

The global EUV lithography market report would provide approximately 61 tables, 57 figures and 182 pages.

Target Audience 2023

  • Manufacturers/ Buyers
  • Industry Investors/Investment Bankers
  • Research Professionals
  • Emerging Companies

Table of Contents

1. Methodology and Scope

  • 1.1. Research Methodology
  • 1.2. Research Objective and Scope of the Report

2. Definition and Overview

3. Executive Summary

  • 3.1. Snippet by Light Source
  • 3.2. Snippet by Application
  • 3.3. Snippet by Equipment
  • 3.4. Snippet by Region

4. Dynamics

  • 4.1. Impacting Factors
    • 4.1.1. Drivers
      • 4.1.1.1. Rising Need for Miniaturization and Associated Increase in Demand for Advanced Semiconductor Devices
      • 4.1.1.2. Technological Advancements and Supportive Government Policies
    • 4.1.2. Restraints
      • 4.1.2.1. Technological Complexity, Exorbitant Cost and Limited Availability of Key Components
      • 4.1.2.2. Regulatory and Safety Concerns, Yield Challenges and Reliability
    • 4.1.3. Opportunity
    • 4.1.4. Impact Analysis

5. Industry Analysis

  • 5.1. Porter's Five Force Analysis
  • 5.2. Supply Chain Analysis
  • 5.3. Pricing Analysis
  • 5.4. Regulatory Analysis

6. COVID-19 Analysis

  • 6.1. Analysis of COVID-19
    • 6.1.1. Scenario Before COVID
    • 6.1.2. Scenario During COVID
    • 6.1.3. Scenario Post COVID
  • 6.2. Pricing Dynamics Amid COVID-19
  • 6.3. Demand-Supply Spectrum
  • 6.4. Government Initiatives Related to the Market During Pandemic
  • 6.5. Manufacturers Strategic Initiatives
  • 6.6. Conclusion

7. By Light Source

  • 7.1. Introduction
    • 7.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 7.1.2. Market Attractiveness Index, By Light Source
  • 7.2. Laser Produced Plasma (LPP)*
    • 7.2.1. Introduction
    • 7.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 7.3. Vacuum Sparks
  • 7.4. Gas Discharges

8. By Application

  • 8.1. Introduction
    • 8.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 8.1.2. Market Attractiveness Index, By Application
  • 8.2. Integrated Device Manufacturer (IDM)*
    • 8.2.1. Introduction
    • 8.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 8.3. Foundry

9. By Equipment

  • 9.1. Introduction
    • 9.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 9.1.2. Market Attractiveness Index, By Equipment
  • 9.2. Light Source*
    • 9.2.1. Introduction
    • 9.2.2. Market Size Analysis and Y-o-Y Growth Analysis (%)
  • 9.3. Mirrors
  • 9.4. Masks
  • 9.5. Others

10. By Region

  • 10.1. Introduction
    • 10.1.1. Market Size Analysis and Y-o-Y Growth Analysis (%), By Region
    • 10.1.2. Market Attractiveness Index, By Region
  • 10.2. North America
    • 10.2.1. Introduction
    • 10.2.2. Key Region-Specific Dynamics
    • 10.2.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.2.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.2.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.2.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.2.6.1. The U.S.
      • 10.2.6.2. Canada
      • 10.2.6.3. Mexico
  • 10.3. Europe
    • 10.3.1. Introduction
    • 10.3.2. Key Region-Specific Dynamics
    • 10.3.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.3.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.3.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.3.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.3.6.1. Germany
      • 10.3.6.2. The UK
      • 10.3.6.3. France
      • 10.3.6.4. Italy
      • 10.3.6.5. Russia
      • 10.3.6.6. Rest of Europe
  • 10.4. South America
    • 10.4.1. Introduction
    • 10.4.2. Key Region-Specific Dynamics
    • 10.4.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.4.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.4.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.4.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.4.6.1. Brazil
      • 10.4.6.2. Argentina
      • 10.4.6.3. Rest of South America
  • 10.5. Asia-Pacific
    • 10.5.1. Introduction
    • 10.5.2. Key Region-Specific Dynamics
    • 10.5.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.5.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.5.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment
    • 10.5.6. Market Size Analysis and Y-o-Y Growth Analysis (%), By Country
      • 10.5.6.1. China
      • 10.5.6.2. India
      • 10.5.6.3. Japan
      • 10.5.6.4. Australia
      • 10.5.6.5. Rest of Asia-Pacific
  • 10.6. Middle East and Africa
    • 10.6.1. Introduction
    • 10.6.2. Key Region-Specific Dynamics
    • 10.6.3. Market Size Analysis and Y-o-Y Growth Analysis (%), By Light Source
    • 10.6.4. Market Size Analysis and Y-o-Y Growth Analysis (%), By Application
    • 10.6.5. Market Size Analysis and Y-o-Y Growth Analysis (%), By Equipment

11. Competitive Landscape

  • 11.1. Competitive Scenario
  • 11.2. Market Positioning/Share Analysis
  • 11.3. Mergers and Acquisitions Analysis

12. Company Profiles

  • 12.1. ASML*
    • 12.1.1. Company Overview
    • 12.1.2. Product Portfolio and Description
    • 12.1.3. Financial Overview
    • 12.1.4. Key Developments
  • 12.2. Canon Inc.
  • 12.3. Intel Corporation
  • 12.4. Nikon Corporation
  • 12.5. NuFlare Technology Inc.
  • 12.6. Samsung Corporation
  • 12.7. SUSS Microtec AG
  • 12.8. Taiwan Semiconductor Manufacturing Company Limited (TSMC)
  • 12.9. Ultratech Inc.
  • 12.10. Vistec Semiconductor Systems

LIST NOT EXHAUSTIVE

13. Appendix

  • 13.1. About Us and Services
  • 13.2. Contact Us