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半導體生產設備半導體製造設備

市場調查報告書

商品編碼

1557249

離子束蝕刻系統市場 – 2024 年至 2029 年預測

Ion Beam Etching System Market - Forecasts from 2024 to 2029

出版日期: 2024年08月13日 | 出版商:

Knowledge Sourcing Intelligence | 英文 135 Pages | 商品交期: 最快1-2個工作天內

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簡介目錄

離子束蝕刻系統市場預計到 2029 年將達到 58.28 億美元，預測期內複合年成長率為 7.06%，從 2024 年的 41.44 億美元成長。

離子束蝕刻是一種化學蝕刻工藝，使用惰性氣體離子去除或塑造材料。它通常是透過將離子束引導到真空室內的基板上來獲得的。該系統通常可以在低壓環境中獨立控制束流和離子通量。受控異向性蝕刻也是可能的。

全球離子束蝕刻系統市場的主要促進因素之一是全球不斷擴大的醫療器材與設備市場。在醫療設備中，離子束蝕刻解決方案可生產小型或微型零件，例如心律調節器和助聽器。醫療設備的生產在全球範圍內顯著擴大。美國是全球市場醫療設備貿易的領先國家之一。經濟複雜性觀察站（OEC）在報告中表示，2022年美國醫療設備進口額約347億美元，高於2021年的約322億美元。

預計離子束蝕刻系統市場將大幅成長。由於奈米技術的使用越來越多，以及眾多組織和公司正在進行的研究計劃導致市場快速開拓，該市場正在不斷成長。推動半導體產業擴張的技術進步也正在擴大束流蝕刻系統市場。

離子束蝕刻系統市場促進因素

半導體需求的增加預計將推動全球離子束蝕刻設備的需求。

半導體是現代電子產品的核心，並且正在被小型化以製造更小、更強大的小工具，因此是全球離子束蝕刻系統市場的關鍵驅動力之一。這需要精確的蝕刻過程。與傳統方法相比，離子束蝕刻具有多種優點，包括高精度、均勻性和靈活性。離子束蝕刻系統具有高精度、均勻性和靈活性，與傳統方法相比具有多種優勢。在微觀尺度上排出材料的能力允許在小晶片上形成複雜的形態，確保整個晶圓表面的可靠蝕刻，這對於高性能半導體至關重要。

此外，美國工業協會（SIA）表示，到2024年4月，全球半導體產業銷售額將約為464億美元。與 2023 年 4 月銷售額約 401 億美元相比，成長約 15.8%。 SIA 代表美國半導體產業，佔銷售額的 99%，約佔非美國晶片公司的三分之二。

此外，SIA 認可世界半導體貿易統計 (WSTS) 組織 2024 年春季的預測，即全球半導體銷售額將從 2024 年的 6,112 億美元增至 2025 年創紀錄的 6,874 億美元，創行業歷史最高紀錄。。在半導體產業，離子束蝕刻解決方案為各類半導體提供高精度蝕刻和可靠有效的蝕刻。隨著半導體產業的擴張，對離子束蝕刻系統的需求預計將進一步增加。

光電子學的日益成長預計將推動離子束蝕刻系統市場的成長。

光電子學涉及研究和使用電子設備進行光源、識別和控制。離子束蝕刻的精度和控制是製造先進光電元件的基礎。這種蝕刻是在雷射、LED、檢測器等光電元件中製造複雜結構的高效且統一的策略，因此已成為擴大離子束蝕刻系統市場規模的主要因素。離子束蝕刻提供了更好的控制和一致性，有助於開發更有效率、高效能的組件。離子束蝕刻可以處理矽以外的許多材料，而矽是製造 LED 和雷射所必需的。

根據國際裝置和系統路線圖（IRDS）2022年報告，全球光電子銷售額不斷成長，預計將從2021年的479億美元增加到2022年的542億美元。此外，據報道，過去十年，光電子產業以約13%的複合成長率（CGR）成長。組件銷售的成長將需要更精確和更先進的離子束蝕刻技術系統，從而導致未來幾年市場擴張的增加。

離子束蝕刻系統市場的地域展望

預計中國將為市場成長做出重大貢獻。

中國半導體產業的成長是市場需求增加的主要因素之一。因此，國內製造設備的投資不斷增加，而對海外半導體的依賴正在減少。離子束蝕刻設備是提高半導體製造精度的一個重要方面。因此，中國的半導體銷售額也在成長。例如，3月份銷售額比去年同月成長27.4%。

推動離子束蝕刻系統採用的另一個因素是奈米技術在中國的快速發展。這些系統用於形成光電子和微電子等各種高科技領域所需的高精度奈米結構。中國對以性能為導向的電子設備日益成長的需求正在推動市場發展。此外，離子束蝕刻系統的準確性和準確度使其適合製造先進組件，例如儲存晶片、感測器和微處理器。

此外，關鍵技術的自給自足也支持了市場，因為市場參與企業生產的產品可以增強國家在特定領域的技術能力。例如，中國製造商Perfect Optics生產用於離子束拋光和蝕刻的高品質高頻離子束源。

此外，2022年2月，Scia System的離子束蝕刻系統提供給中國新成立的研究所之江實驗室。該系統可為最大 150mm 的各種基板尺寸提供反應離子束蝕刻和高度均勻的離子束蝕刻。該系統配備了基板加載鎖，可快速處理。對於尖端基礎研究和研發應用，Scia Mill 150 因其節省空間的設計和可選的穿牆安裝而成為理想選擇。

離子束蝕刻系統的主要市場參與企業

Veeco-Veeco 開發、製造和銷售離子束蝕刻系統，促進全球高科技電子設備的開發和生產。在 Veeco NEXUS 的眾多應用中，IBE 系統可精確蝕刻金屬薄膜，以生產各種 MRAM、硬碟、行動裝置和汽車裝置所需的磁感測器。
Scia Systems GmbH - Scia Systems 製造和開發離子束和等離子體處理設備，用於在大批量生產和研發環境中製造微電子、MEMS 和精密光學元件。
牛津儀器 - 牛津儀器是工業和研究領域尖端系統和工具的領先供應商。我們開發和製造離子等離子體、離子束蝕刻和沉澱技術。

Ion beam etching is a chemical etching process that uses inert gas ions to remove or shape materials. It is generally obtained by directing the beam of ions at the substrate in a vacuum chamber. This system allows the independent control of beam and ion flux, generally in lower-pressure environments. It also produces controlled anisotropic etching.

One of the major driving factors for the global ion beam etching system market can be the global expanding medical device and equipment market. In medical devices, the ion beam etching solutions create small or micro-scale components, like pacemakers and hearing aids. Medical device production is expanding significantly worldwide. The USA is among the leading nations in the trade of medical instruments in the global market. The Observatory of Economic Complexity (OEC) stated in its report that in 2022, the medical instrument import of the US was recorded at about US$34.7 billion, which grew from about US$32.2 billion in 2021.

The ion beam etching system market is projected to rise significantly. The market is growing due to the increasing use of nanotechnology and its quick development due to ongoing research projects carried out by numerous organizations and businesses. Technological advancements driving the semiconductor industry's expansion are also expanding the market for beam etching systems.

ION BEAM ETCHING SYSTEM MARKET DRIVERS:

Increasing demand for semiconductors is anticipated to boost the demand for ion beam etching systems globally.

Semiconductors are one of the major drivers for the global ion beam etching system market as they are the center of modern electronic devices, which are miniaturized to make smaller, more powerful gadgets. This requires precise etching procedures. Ion beam etching offers several advantages over traditional methods, incorporating high accuracy, uniformity, and flexibility. The ion beam etching system provides various benefits over traditional procedures, incorporating high accuracy, uniformity, and flexibility. It can evacuate material at a tiny scale, creating intricate features on small-sized chips and ensuring reliable etching across the wafer surface essential for high-performance semiconductors.

Moreover, the Semiconductor Industry Association (SIA) expressed that the global semiconductor industry sales reached around US$46.4 billion by April 2024. This represented an increment of approximately 15.8% compared to April 2023, when the sales were recorded at around US$40.1 billion. SIA represents the U.S. semiconductor industry, accounting for 99% of revenue and about two-thirds of non-U.S. chip firms.

Further, SIA endorsed the World Semiconductor Trade Statistics (WSTS) organization's spring 2024 worldwide semiconductor sales estimate, anticipating an increment from $611.2 billion in 2024 to a record $687.4 billion in 2025, marking the industry's highest-ever yearly sales total. In the semiconductor industry, ion beam etching solution provides high-precision etching and dependable and effective etching for different types of semiconductors. As the semiconductor industry expands, the demand for the ion beam itching system is additionally anticipated to increase.

Rising utilization of optoelectronics is predicted to bolster the ion beam itching system market growth.

Optoelectronics includes studying and utilizing electronic gadgets that source, identify, and control light. The accuracy and control of ion beam etching are fundamental for manufacturing progressed optoelectronic components. This is a major factor leading to the growing market size of the ion beam etching system, as this etching is a highly effective and uniform strategy for making complicated structures in optoelectronic gadgets such as lasers, LEDs, and photodetectors. It offers high control and consistency, empowering the advancement of more productive and high-performance components. Ion beam etching can handle many materials beyond silicon, which are required to manufacture LEDs and lasers.

The International Roadmap for Devices and Systems (IRDS) 2022 report stated a constant rise in the global sales of optoelectronics, which was forecasted to rise from $47.9 billion in 2021 to $54.2 billion in 2022. Moreover, it was reported that for the last 10 years, optoelectronics has been growing at about 13% Compound Growth Rate (CGR). This rise in component sales would demand a more precise and progressed ion beam etching techniques system, leading to an increment in the market expansion in the coming years.

Ion Beam Etching System Market Geographical Outlook

China is predicted to contribute at a substantial pace to market growth.

China's growth in the semiconductor industry is one major factor that is increasing the market demand. This has led to increased domestic investments in manufacturing facilities while reducing reliance on international semiconductors. Ion beam etching systems are required as a critical aspect of semiconductor production to improve its accuracy. This has also increased the sales of semiconductors in China. For instance, the year-over-year sales in March rose by 27.4%.

Another factor driving the adoption of ion beam etching systems is rapid advancements in nanotechnology in China. These systems are used to form very precise nanostructures required in different hi-tech sectors, such as optoelectronics and microelectronics. In China, there is a rise in the need for performance-oriented electronic devices, which is leading the market. Moreover, due to their accuracy and precision, ion beam etching systems are suitable for creating advanced components such as memory chips, sensors, and microprocessors.

Further, market players manufacture products that increase a country's technological capacity in a particular area, and self-sufficiency in crucial technologies also supports the market. For instance, the Chinese manufacturer Perfect Optics produces a high-quality radio frequency ion beam source for ion beam polishing and etching.

Moreover, in February 2022, Zhejiang Lab, a new research institute in China, was provided with an Ion Beam Etching System from Scia System. The system will accomplish reactive ion beam etching and high uniform ion beam etching on varying substrate sizes up to 150 mm. It is fitted with a single substrate load lock for quicker processing. Cutting-edge and fundamental research, as well as R&D applications, are best served by the Scia Mill 150 because of its space-saving design and optional through-the-wall installation.

Ion Beam Etching System Key Market Players:

Veeco - Veeco develops, produces, and sells ion beam etching systems that facilitate global high-tech electronic device development and production. Among the many uses for the Veeco NEXUS, IBE systems are precisely etching metallic films to produce the magnetic sensors needed for a wide range of MRAM, hard drives, mobile, and automotive devices.
Scia Systems GmbH- Scia Systems manufactures and develops ion beam and plasma processing equipment for producing microelectronics, MEMS, and precision optical components in high-volume and R&D environments. Multiple vacuum process chambers can be combined into cluster or in-line solutions, depending on the customer's needs, because of their flexible and modular design.
Oxford Instruments - Oxford Instruments is a top supplier of cutting-edge systems and tools for industry and research. It creates and produces technologies for ion plasma and ion beam etching and deposition.

Market Segmentation:

The Ion Beam Etching System Market is segmented and analyzed as below:

By Type

Compact ion beam etching machine
Single wafer type ion beam etching machine
Batch-type ion beam etching machine
Others

By Application

MEMS
Sensors
Power devices
High-frequency devices and optical devices
Others

By Geography

Americas
USA
Canada
Others
Europe, the Middle East, and Africa
Germany
France
United Kingdom
Others
Asia Pacific
China
Japan
India
South Korea
Taiwan
Others

1. INTRODUCTION

1.1. Market Overview
1.2. Market Definition
1.3. Scope of the Study
1.4. Market Segmentation
1.5. Currency
1.6. Assumptions
1.7. Base and Forecast Years Timeline
1.8. Key benefits for the stakeholders

2. RESEARCH METHODOLOGY

2.1. Research Design
2.2. Research Process

3. EXECUTIVE SUMMARY

3.1. Key Findings

4. MARKET DYNAMICS

4.1. Market Drivers
4.2. Market Restraints
4.3. Porter's Five Forces Analysis
- 4.3.1. Bargaining Power of Suppliers
- 4.3.2. Bargaining Power of Buyers
- 4.3.3. Threat of New Entrants
- 4.3.4. Threat of Substitutes
- 4.3.5. Competitive Rivalry in the Industry
4.4. Industry Value Chain Analysis
4.5. Analyst view

5. ION BEAM ETCHING SYSTEM MARKET BY TYPE

5.1. Introduction
5.2. Compact ion beam etching machine
5.3. Single wafer type ion beam etching machine
5.4. Batch-type ion beam etching machine
5.5. Others

6. ION BEAM ETCHING SYSTEM MARKET BY APPLICATION

6.1. Introduction
6.2. MEMS
6.3. Sensors
6.4. Power devices
6.5. High-frequency devices and optical devices
6.6. Others

7. ION BEAM ETCHING SYSTEM MARKET BY GEOGRAPHY

7.1. Introduction
7.2. Americas
- 7.2.1. By Type
- 7.2.2. By Application
- 7.2.3. By Country
  - 7.2.3.1. USA
  - 7.2.3.2. Canada
  - 7.2.3.3. Others
7.3. Europe, the Middle East, and Africa
- 7.3.1. By Type
- 7.3.2. By Application
- 7.3.3. By Country
  - 7.3.3.1. Germany
  - 7.3.3.2. France
  - 7.3.3.3. United Kingdom
  - 7.3.3.4. Others
7.4. Asia Pacific
- 7.4.1. By Type
- 7.4.2. By Application
- 7.4.3. By Country
  - 7.4.3.1. China
  - 7.4.3.2. Japan
  - 7.4.3.3. India
  - 7.4.3.4. South Korea
  - 7.4.3.5. Taiwan
  - 7.4.3.6. Others