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市場調查報告書
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1560201

金屬濺鍍靶材市場報告:2030 年趨勢、預測與競爭分析

Metal Sputtering Target Material Market Report: Trends, Forecast and Competitive Analysis to 2030

出版日期: | 出版商: Lucintel | 英文 150 Pages | 商品交期: 3個工作天內

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簡介目錄

金屬濺鍍靶材的發展趨勢與預測

預計2030年,全球金屬濺鍍靶材市場將達到約47億美元,2024年至2030年的複合年成長率為5.8%。該市場的主要驅動力是這種材料在太陽能電池行業中大量用於薄膜太陽能電池塗層、對高品質紋理薄膜和顆粒的需求不斷增加,以及基於這種材料的 3D 列印的偏好不斷增加。全球金屬濺鍍靶材市場前景廣闊,半導體、太陽能和平板顯示應用領域充滿機會。

Lucintel 預測,由於純金屬在金屬濺鍍靶材生產中的大量使用,因此純金屬將繼續成為較大的細分市場。

在該市場中,由於在玻璃和觸控螢幕電極的生產中擴大使用金屬濺鍍靶材,預計平板顯示器在預測期內將出現最高成長。

金屬濺鍍靶材市場新趨勢

金屬濺鍍靶材所用材料的市場正在發生變化,新趨勢影響著產業營運和技術創新。這些趨勢將影響濺鍍材料在各個領域的需求、生產方法和應用。目前影響市場的五個最重要的趨勢概要如下。

  • 電子產品的小型化:隨著電子產品變得越來越小,對能夠實現高精度和高性能的濺鍍靶材的需求不斷增加。這一趨勢正在影響新型材料的創造,以滿足現代對更小、更節能組件的需求,例如半導體製造中的組件。
  • 環保製造:環境問題促使製造商採用環保製造流程。這方面的一個例子是使用永續投入和節能生產方法。此外,作為其對全球永續性目標承諾的一部分,該公司致力於最大限度地減少濺鍍靶材製造過程中的廢棄物和排放。
  • 先進材料的開發:具有改進性能的先進材料的開發,例如高純度、改進的導電性和耐用性,正在引起人們的注意。這一趨勢與航太等高科技應用尤其相關,其中濺鍍靶材的性能會對最終產品產生重大影響。這一趨勢是由新型合金和複合材料的探索所推動的。
  • 可再生能源的成長:太陽能電池板和風力發電機正在成為流行的可再生能源,擴大了濺鍍靶材的市場。然而,能量轉換和儲存設備中使用的薄膜塗層需要這些材料。由於這些趨勢,人們正在投資開發專門針對可再生能源應用最佳化的濺鍍靶材。
  • 專注於成本效率:面臨激烈競爭的製造商正在尋找在不影響品質的情況下降低生產成本的方法。這包括最佳化製造流程、使用更便宜的材料以及提高產量。此外,公司正在探索聯盟和合併,以實現濺鍍靶材生產的規模經濟。

這些未來方向將從根本上改變金屬濺鍍靶材市場的技術創新、永續性和成本效益。隨著產業的變化,這些發展將成為決定產業最終路徑的關鍵。

金屬濺鍍靶材市場近期趨勢

金屬濺鍍靶材市場目前正在經歷許多變化,這些變化正在改變全球供應鏈和技術進步。這些變化是由可再生能源、電子和汽車等各個行業不斷成長的需求所推動的。以下是塑造該市場的五個關鍵促進因素。

  • 投資半導體產業:金屬濺鍍靶材業務持續受到半導體產業的啟發。本公司正大力投資研發活動,旨在開發滿足半導體製造(特別是先進節點)相關嚴格要求的高純度靶材。
  • 提高產能:許多公司正在擴大產能,以滿足不斷成長的濺鍍靶材需求。此次擴張包括建立新的製造工廠和升級現有設施,以提高產量和效率,特別是在中國和日本等亞太地區。
  • 創新技術開發:在材料科學中,技術創新正在推動新型濺鍍靶材的誕生,其性能超越了前輩。這包括開發具有更高熱穩定性、更高純度水平以及在高溫條件下具有更好性能的靶材,特別是對於航太和國防工業。
  • 策略夥伴關係與協作:夥伴關係和協作現在對企業來說是創新和拓展市場的重要方式。這種夥伴關係關係通常涉及材料供應商(主要是電子製造商)之間的合資企業,為特定應用生產客製化濺鍍靶材。
  • 對永續性的承諾:對永續性的日益關注導致採用環保方法來製造濺鍍靶材。這包括採用綠色技術,旨在透過使用回收材料來減少公司的碳排放,並減少製造過程中消耗的能源。

因此,成長、創新和永續性是金屬濺鍍靶材市場中受這些因素影響的一些催化劑。隨著產業繼續經歷進一步轉型,這些關鍵里程碑對於塑造其未來發展方向至關重要。

金屬濺鍍靶材市場的策略性成長機會

金屬濺鍍靶材產業的各種應用提供了許多策略成長機會。例如,電子、能源和汽車行業的技術進步和需求增加正在推動這一趨勢。以下五個市場趨勢將決定其未來。

  • 半導體製造:濺鍍靶材是半導體產業發展的巨大機會。隨著電子設備變得更小、更快、更有效率,對高純度濺鍍靶材的需求不斷增加。該領域的創新可以為公司提供競爭優勢,特別是隨著全球半導體市場的擴張。
  • 可再生能源應用:太陽能電池板和風力發電機等可再生能源技術的日益使用正在增加濺鍍靶材的消費量。此類產品可應用於能量轉換裝置中使用的薄膜塗層。專注於開發符合可再生能源需求的濺鍍靶材的公司可以開拓這一成長領域。
  • 汽車產業:電動車(EV)和先進駕駛輔助系統(ADAS)正在增加汽車產業對高性能濺鍍靶材的需求。這些材料用於製造電動車和 ADAS 所必需的感測器等電子元件,這些材料的生產商在可預見的未來將擁有巨大的成長機會。
  • 航太和國防:國防部門也需要具有高熱穩定性和耐用性的濺鍍靶材,這需要極高的性能。生產具有獨特性能、滿足嚴格要求的定製材料是推動濺鍍靶材領域進一步市場開拓的關鍵策略。
  • 顯示技術:在顯示技術領域,濺鍍靶材常用於沉積OLED、LCD等顯示器的薄膜。因此,隨著對軟性螢幕和高清顯示器的需求不斷增加,對於能夠設計提高顯示效率和性能的靶材濺鍍材料的公司來說,存在著誘人的成長潛力。

這些策略性成長機會正在推動金屬濺鍍靶材市場的創新和擴張。透過利用這些機會,公司可以在高度競爭的環境中佔據有利地位,從而獲得長期成功。

金屬濺鍍靶材市場的促進因素與挑戰

金屬濺鍍靶材市場受到各種市場促進因素和挑戰的影響,包括技術進步、經濟考量和監管問題。關注這些因素對於了解市場動態非常重要。以下是塑造市場動態的五個關鍵促進因素和三個關鍵挑戰。

推動金屬濺鍍靶材市場的因素是:

1.技術進步:電子和半導體技術的不斷進步推動了半導體製造(尤其是先進節點)對高效能濺鍍靶材的需求。

2.消費性電子產品需求增加:由於智慧型手機、平板電腦、穿戴式裝置等的增加,以濺鍍生產電子元件將帶動市場成長。

3.可再生能源領域的擴張:隨著太陽能板和風力發電機等能源系統的採用,能量轉換和儲存設備的應用正在推動這一趨勢,增加了對濺鍍靶材使用的需求。

4.汽車工業的成長:向電動車的轉變和ADAS(高級駕駛輔助系統)的進步需要高品質的濺鍍靶材,特別是用於汽車內的電子元件和感測器。

5.增加研發投入:為了滿足產業相關人員的需求,公司正在投入大量研究來開發具有更好性能的創新濺鍍靶材,例如高純度水準和熱穩定性。

金屬濺鍍靶材市場面臨的挑戰是:

1.製造成本高:製造高純度濺鍍靶材需要先進的技術及工藝,導致製造成本高。

2. 監管合規性:從環保角度來看,濺鍍靶材市場受到嚴格監管。這些法規增加了進入該市場的公司的製造成本並限制了新進入。

3. 供應鏈中斷:該市場依賴的原料供應可能會因衝突、禁運或自然災害而中斷。這會增加價格並影響用戶可用的數量。

金屬濺鍍靶材市場受到技術進步和重點產業需求成長的支撐,但也面臨生產成本高和監管合規等挑戰。在這種競爭環境中取得成功取決於成功地利用這些力量和障礙。

金屬濺鍍靶材依細分領域

本研究包括按類型、應用和地區對全球金屬濺鍍靶材進行預測。

各國金屬濺鍍靶材各國市場展望

電子、能源和汽車工業等各個領域的技術進步和需求不斷成長正在推動金屬濺鍍靶材市場的成長。美國、中國、德國、印度和日本等領導企業正在塑造全球市場動態,這些企業正在推動創新和生產能力。在這裡我們介紹這些地區的最新趨勢。

  • 美國:美國在半導體製造和可再生能源方面取得了長足進展。為此,對高純度金屬濺鍍靶材的需求不斷增加。特別是,提高電子產品濺鍍效率和性能的新材料和合金的研究和開發正在取得進展。材料科學是由研究機構和產業領導者之間的策略夥伴關係關係所推動的。
  • 中國:中國仍然是主導者,大規模投資旨在擴大產能。該國的主要目標之一是半導體產業的成長,該產業嚴重依賴金屬濺鍍靶材。中國製造商也考慮在濺射靶材應用中使用稀土,以獲得先進技術工具的競爭優勢。
  • 德國:德國的先進製造徹底改變了金屬濺鍍靶材市場。該國對高性能濺鍍材料進行前沿研究,特別是用於汽車和航太領域。德國公司正在與大學合作研究新材料成分和製造這些產品的流程。
  • 印度 印度的電子工業和可再生能源工業使印度成為金屬濺鍍靶材市場的主要企業。隨著政府推動本地生產,製造商正在增加對濺鍍靶材製造工廠的投資。有鑑於此,印度公司擴大利用現代技術來生產可跨境運輸的優質產品。
  • 日本:日本處於生產高純度金屬濺鍍靶材的前沿,主要用於電子產業。日本公司正專注於技術創新,旨在創造改進晶片製造流程的新材料。此外,該國還尋求透過使用環保的生產方法來減少目標製造業的生態足跡。

常問問題

Q.1 金屬濺鍍靶材的市場規模有多大?

A1. 至2030年,全球金屬濺鍍靶材市場預計將達到47億美元。

Q.2 金屬濺鍍靶材市場的成長預測如何?

A2. 預計2024年至2030年全球金屬濺鍍靶材市場將以5.8%的複合年成長率成長。

Q.3 影響金屬濺鍍靶材市場成長的關鍵促進因素有哪些?

A3. 該市場的主要驅動力是這種材料在太陽能電池行業中薄膜太陽能電池塗層的大量使用、對高品質紋理薄膜和顆粒的需求不斷成長,以及基於這種材料的3D 列印的需求不斷成長。

Q4.市場的主要細分市場是:

A4. 金屬濺鍍靶材市場前景廣闊,在半導體、太陽能和平板顯示器應用領域中存在機會。

Q5.市場的主要企業是:

A5. 金屬濺鍍靶材的主要企業如下:

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Q6.未來最大的細分市場是什麼?

A6.Lucintel 預測,純金屬將繼續成為一個更大的細分市場,因為它們被大量用於金屬濺鍍靶材的生產。

Q7. 未來五年預計哪些地區的市場成長最大?

由於該地區半導體和數位電子產業濺鍍靶材產品的利用率不斷增加,預計 A7.APAC 在預測期內將出現最高成長。

Q8. 可以客製化報告嗎?

A8. 是的,Lucintel 提供 10% 的客製化服務,無需額外付費。

目錄

第1章執行摘要

第2章全球金屬濺鍍靶材市場:市場動態

  • 簡介、背景、分類
  • 供應鏈
  • 產業促進因素與挑戰

第3章 2018-2030年市場趨勢及預測分析

  • 宏觀經濟趨勢(2018-2023)與預測(2024-2030)
  • 全球金屬濺鍍靶材市場趨勢(2018-2023)與預測(2024-2030)
  • 全球金屬濺鍍靶材市場,依類型
    • 純金屬
    • 合金
  • 全球金屬濺鍍靶材市場(依應用)
    • 半導體
    • 太陽能
    • 平面顯示器

第4章 2018-2030年區域市場趨勢及預測分析

  • 全球金屬濺鍍靶材市場區域分佈
  • 北美金屬濺鍍靶材市場
  • 歐洲金屬濺鍍靶材市場
  • 亞太金屬濺鍍靶材市場
  • 其他地區金屬濺鍍靶材市場

第5章 競爭分析

  • 產品系列分析
  • 營運整合
  • 波特五力分析

第6章 成長機會與策略分析

  • 成長機會分析
    • 全球金屬濺鍍靶材市場的成長機會(按類型)
    • 全球金屬濺鍍靶材市場應用的成長機會
    • 全球金屬濺鍍靶材市場按地區成長機會
  • 全球金屬濺鍍靶材市場新趨勢
  • 戰略分析
    • 新產品開發
    • 全球金屬濺鍍靶材市場產能擴張
    • 全球金屬濺鍍靶材市場併購及合資企業
    • 認證和許可

第7章主要企業概況

  • JX Nippon Mining & Metals
  • Praxair
    • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • GRIKIN Advanced Material
簡介目錄

Metal Sputtering Target Material Trends and Forecast

The future of the global metal sputtering target material market looks promising with opportunities in the semiconductor, solar energy, and flat panel display applications. The global metal sputtering target material market is expected to reach an estimated $4.7 billion by 2030 with a CAGR of 5.8% from 2024 to 2030. The major drivers for this market are significant use of this material in the solar industry for thin-film solar cell coatings, growing demand for high-quality texture films and particles, and increasing preference for this material based 3D printing.

Lucintel forecasts that pure metal will remain the larger segment due to the its substantial usage in the production of metal sputtering targets.

Within this market, flat panel display is expected to witness highest growth over the forecast period due to growing use of metal sputtering target materials in the production of glass and touch screen electrodes.

Emerging Trends in the Metal Sputtering Target Material Market

The market for materials used in metal sputtering targets is changing with new trends influencing how the industry operates and enhancing innovation. These trends affect demand, production methods, and uses of sputter materials across different sectors. Outlined below are the five most critical trends that currently impact the market.

  • Electronics Miniaturization: As electronics become smaller in size, there is a growing need for sputtering targets that can deliver high precision and performance. This drift has influenced the creation of new kinds of materials that meet modern demands like those seen in semiconductor manufacturing towards tinier, more energy-efficient components.
  • Environmentally Friendly Manufacturing: Environmental concerns have made manufacturers embrace green manufacturing processes. A case in point is the use of sustainable inputs and energy-efficient modes of production. Moreover, companies are striving to minimize waste and emissions during sputtering target productions as part of their commitment to global sustainability goals.
  • Advanced Material Development: The development of advanced materials with improved properties, such as higher purity, better conductivity, and improved durability, is gaining prominence. This trend is especially relevant in high-tech applications like aerospace where the performance of sputtering targets can have a significant effect on the final product. This trend is being driven by research into new alloys and composites.
  • Growth in Renewable Energy: Solar panels and wind turbines are becoming more popular forms of renewable energy resources that have an increasing market for sputtering targets. However, these materials are necessary for thin-film coatings used in energy conversion and storage devices. As a result of this trend, there have been investments in creating sputtering targets that would be specifically optimized for use in renewable energy applications.
  • Increased Focus on Cost Efficiency: Manufacturers under stiff competition are seeking ways to lower production costs without affecting quality. This includes optimizing the manufacturing process, using cheaper materials, and improving production yields. Moreover, companies are exploring partnerships and mergers to achieve economies of scale in sputtering target production.

These future directions are essentially altering the metal sputtering target material market using innovation, sustainability, and cost-effectiveness. As industries change, these developments will probably be key in determining the ultimate path of the industry.

Recent Developments in the Metal Sputtering Target Material Market

The market for metal sputtering target material is currently experiencing a lot of changes that are transforming global supply chains and technological advancements. These changes have been triggered by the rise in demand in different fields such as renewable energy, electronics, and automotive. Below are five key drivers shaping this market.

  • Investments in the Semiconductor Industry: Metal sputtering target business continues to receive impetus from the semiconductor industry. Companies are investing heavily in R&D activities aimed at developing high-purity targets that meet stringent requirements of semiconductor manufacturing particularly those related to advanced nodes.
  • Increase in Production Capacities: Many companies are expanding their production capacities to serve the growing demand for sputtering targets. This expansion encompasses setting up new manufacturing plants and upgrading existing facilities to improve output and efficiency, especially in Asia-Pacific regions like China and Japan.
  • Innovative Technological Developments: In material science, innovation has facilitated the creation of novel sputtering targets with properties that surpass preceding ones. These include the development of targets having improved thermal stabilities, enhanced purity levels as well as better performance even under high-temperature conditions specifically for aerospace and defense industries.
  • Strategic Partnerships and Collaborations: Partnerships and collaborations are now vital to companies as a way of initiating innovation and broadening their markets. In many cases, such partnerships involve joint ventures between material suppliers, mainly producers of electronic equipment to make customized sputtering targets for defined applications.
  • Sustainability Initiatives: The emphasis on sustainability has resulted in the adoption of eco-friendly methods of producing sputtering targets. These include embracing green technologies aimed at reducing their companies' carbon footprint through the utilization of recycled materials and cutting down energy consumed in manufacturing processes.

Consequently, growth, innovations, and sustainability are some catalysts that have been affected by these factors in the metal sputtering target material market. Going forward, these major milestones will be pivotal in shaping its future route as the industry transforms further.

Strategic Growth Opportunities for Metal Sputtering Target Material Market

Various applications in the metal sputtering target material industry are offering an array of strategic growth opportunities. These spellings are being driven by technological improvements and increasing demands within the electronic, energy, and automotive industries for example. The following five market trends will define its future.

  • Semiconductor Manufacturing: Sputtering target materials is a major opportunity for the semiconductors industry to grow. Smaller, faster, and more efficient electronic devices have led to increasing demand for high-purity sputtering targets. Innovations in this area can give companies a competitive advantage especially as global semiconductor markets expand.
  • Renewable Energy Applications: The increased usage of renewable energy technologies such as solar panels and wind turbines has led to increased consumption of sputtering targets. Such products find application in thin film coatings used in energy conversion devices. Companies that focus on developing sputter targets matched with renewable energy needs can explore this growing sector.
  • Automotive industry: Given electric vehicles (EVs) and advanced driver-assistance systems (ADAS), the automotive industry has a rising requirement for high-performance sputtering targets. For its foreseeable future, the producers of these substances who are to be used in manufacturing electronic parts, such as sensors critical to EVs and ADAS, will have a great opportunity for growth.
  • Aerospace and Defense: Highly thermal stable and durable sputtering targets are demanded by the defense sector which needs extreme performance as well. The production of made-to-order materials with unique properties that meet strict requirements is an important strategy driving further market development in the field of sputtering targets.
  • Display Technology: The display technology sector relies heavily on sputtering targets for thin film deposition in displays such as OLED and LCD screens. Therefore, there is an attractive growth possibility for firms capable of designing targeted sputtering material enhancing display efficiency and performance, due to increased demand for flexible screens and high-definition displays.

These strategic growth opportunities are driving innovation and expansion in the metal sputtering target material market. By capitalizing on these opportunities, companies can position themselves advantageously in a very competitive environment leading to long-term success.

Metal Sputtering Target Material Market Driver and Challenges

The market for metal sputtering target materials is influenced by various drivers and challenges like technology advancements, economic considerations, and regulatory issues. To understand the dynamics of the market, it is very crucial to note these factors. Following are five main drivers and three key challenges that shape the market dynamics.

The factors responsible for driving the metal sputtering target material market include:

1. Technological Advancements: The demand for high-performance sputtering targets required in semiconductor manufacturing, particularly in advanced nodes is driven by continuous developments in electronics and semiconductor technologies.

2. Growing Demand for Consumer Electronics: The production of electronic components through sputtering leads to market growth because of the increase in smartphones, tablet computers, wearable devices, etc.

3. Expansion of Renewable Energy Sector: The energy conversion and storage equipment applications are driving this trend by the adoption of energy systems such as solar panels and wind turbines leading to an increasing need for the use of sputtering targets

4. Automotive Industry Growth: High-quality sputtering targets used especially for electronic components & sensors within vehicles are required due to the electric vehicle shift as well as advancement towards ADAS (Advanced Driver Assistance Systems).

5. Increased Investment in R&D: To meet the demands of industry players companies are heavily investing in research aiming at coming up with innovative sputter target materials with better properties like higher purity levels or better thermal stability.

Challenges in the metal sputtering target material market are:

1. High Production Costs: Making high-purity sputtering targets needs advanced technology and processes, which result in expensive manufacturing, a position that is beyond the reach of most small enterprises.

2. Regulatory Compliance: The sputtering target material market is heavily regulated in terms of environmental protection. These regulations add production costs for companies venturing into this market and limit newcomers.

3. Supply Chain Disruptions: The market depends on raw material supplies whose availability may be hampered by conflicts, embargoes as well as natural calamities. This raises prices and affects the volumes available to users.

The metal sputtering target material market works on technological improvements as well as increasing demand from key industries; however, it has also been hit with challenges such as high production expenses and adherence to laws. Success within this competitive environment partly hinges on negotiating these forces alongside obstacles.

List of Metal Sputtering Target Material Companies

Companies in the market compete on the basis of product quality offered. Major players in this market focus on expanding their manufacturing facilities, R&D investments, infrastructural development, and leverage integration opportunities across the value chain. With these strategies metal sputtering target material companies cater increasing demand, ensure competitive effectiveness, develop innovative products & technologies, reduce production costs, and expand their customer base. Some of the metal sputtering target material companies profiled in this report include-

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Metal Sputtering Target Material by Segment

The study includes a forecast for the global metal sputtering target material by type, application, and region.

Metal Sputtering Target Material Market by Type [Analysis by Value from 2018 to 2030]:

  • Pure Metal
  • Alloy

Metal Sputtering Target Material Market by Application [Analysis by Value from 2018 to 2030]:

  • Semiconductor
  • Solar Energy
  • Flat Panel Display

Metal Sputtering Target Material Market by Region [Analysis by Value from 2018 to 2030]:

  • North America
  • Europe
  • Asia Pacific
  • The Rest of the World

Country Wise Outlook for the Metal Sputtering Target Material Market

Technological advancements and increased demand in various sectors like the electronics, energy, and automobile industries have boosted growth in the Metal Sputtering Target Materials market. The global market dynamics are shaped by leaders such as the United States, China, Germany, India, and Japan who are driving innovations and production capabilities. This is a glimpse of some of the latest developments in these regions.

  • United States: In the US there have been huge strides when it comes to semiconductor manufacturing as well as renewable energy. This has seen a demand for high-purity metal sputtering targets increase. Research is being done into developing new materials and alloys that improve sputter efficiency and performance of products especially in electronics. Material science is being driven by strategic partnerships between research institutions and industry giants.
  • China: China remains a prominent player with massive investments aimed at expanding production capacities. One major goal of the nation is to grow its semiconductor industry which depends heavily on metal sputtering targets. Chinese manufacturers also consider rare earth metals for use in their sputter target applications to gain a competitive edge in advanced technology tools.
  • Germany: Advanced manufacturing in Germany has revolutionized the metal sputtering target market. This nation is doing cutting-edge research for better-performing sputtering materials which are particularly used in automotive and aerospace sectors. German firms work with universities to make new material compositions and processes for the production of these items.
  • India: India's electronics and renewable energy industries have propelled it forward as a leading player in the market for metal sputtering targets. The government's push to manufacture locally makes manufacturers invest more into sputtering target-making plants. In this light, there is an increased use of modern technologies by Indian companies producing quality stuff that can be shipped across borders.
  • Japan: Japan remains at the forefront of high-purity metal sputtering targets production mainly targeted for the electronics industry. Japanese companies focus on innovations, which are aimed at creating new materials that could enhance the chip-making process. Besides, this country attempts to reduce the ecofootprint of its target making industry by using environmental friendly production methods.

Features of the Global Metal Sputtering Target Material Market

Trend and Forecast Analysis: Market trends (2018 to 2023) and forecast (2024 to 2030) by various segments and regions.

Segmentation Analysis: Metal sputtering target material market size by type, application, and region in terms of value ($B).

Regional Analysis: Metal sputtering target material market breakdown by North America, Europe, Asia Pacific, and Rest of the World.

Growth Opportunities: Analysis of growth opportunities in different types, applications, and regions for the metal sputtering target material market.

Strategic Analysis: This includes M&A, new product development, and competitive landscape of the metal sputtering target material market.

Analysis of competitive intensity of the industry based on Porter's Five Forces model.

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FAQ

Q.1 What is the metal sputtering target material market size?

Answer: The global metal sputtering target material market is expected to reach an estimated $4.7 billion by 2030.

Q.2 What is the growth forecast for metal sputtering target material market?

Answer: The global metal sputtering target material market is expected to grow with a CAGR of 5.8% from 2024 to 2030.

Q.3 What are the major drivers influencing the growth of the metal sputtering target material market?

Answer: The major drivers for this market are significant use of this material in the solar industry for thin-film solar cell coatings, growing demand for high-quality texture films and particles, and increasing preference for this material based 3D printing.

Q4. What are the major segments for metal sputtering target material market?

Answer: The future of the metal sputtering target material market looks promising with opportunities in the semiconductor, solar energy, and flat panel display applications.

Q5. Who are the key metal sputtering target material market companies?

Answer: Some of the key metal sputtering target material companies are as follows:

  • JX Nippon Mining & Metals
  • Praxair
  • Plansee
  • Mitsui Mining & Smelting
  • Hitachi Metals
  • Honeywell
  • Sumitomo Chemical
  • ULVAC
  • Materion
  • Grikin Advanced Material

Q6. Which metal sputtering target material market segment will be the largest in future?

Answer: Lucintel forecasts that pure metal will remain the larger segment due to the its substantial usage in the production of metal sputtering targets.

Q7. In metal sputtering target material market, which region is expected to be the largest in next 5 years?

Answer: APAC is expected to witness highest growth over the forecast period due to rising sputtering target product utilization in the semiconductor and digital electronics sectors of the region.

Q.8 Do we receive customization in this report?

Answer: Yes, Lucintel provides 10% customization without any additional cost.

This report answers following 11 key questions:

  • Q.1. What are some of the most promising, high-growth opportunities for the metal sputtering target material market by type (pure metal and alloy), application (semiconductor, solar energy, and flat panel display), and region (North America, Europe, Asia Pacific, and the Rest of the World)?
  • Q.2. Which segments will grow at a faster pace and why?
  • Q.3. Which region will grow at a faster pace and why?
  • Q.4. What are the key factors affecting market dynamics? What are the key challenges and business risks in this market?
  • Q.5. What are the business risks and competitive threats in this market?
  • Q.6. What are the emerging trends in this market and the reasons behind them?
  • Q.7. What are some of the changing demands of customers in the market?
  • Q.8. What are the new developments in the market? Which companies are leading these developments?
  • Q.9. Who are the major players in this market? What strategic initiatives are key players pursuing for business growth?
  • Q.10. What are some of the competing products in this market and how big of a threat do they pose for loss of market share by material or product substitution?
  • Q.11. What M&A activity has occurred in the last 5 years and what has its impact been on the industry?
  • Market Report

Table of Contents

1. Executive Summary

2. Global Metal Sputtering Target Material Market : Market Dynamics

  • 2.1: Introduction, Background, and Classifications
  • 2.2: Supply Chain
  • 2.3: Industry Drivers and Challenges

3. Market Trends and Forecast Analysis from 2018 to 2030

  • 3.1. Macroeconomic Trends (2018-2023) and Forecast (2024-2030)
  • 3.2. Global Metal Sputtering Target Material Market Trends (2018-2023) and Forecast (2024-2030)
  • 3.3: Global Metal Sputtering Target Material Market by Type
    • 3.3.1: Pure Metal
    • 3.3.2: Alloy
  • 3.4: Global Metal Sputtering Target Material Market by Application
    • 3.4.1: Semiconductor
    • 3.4.2: Solar Energy
    • 3.4.3: Flat Panel Display

4. Market Trends and Forecast Analysis by Region from 2018 to 2030

  • 4.1: Global Metal Sputtering Target Material Market by Region
  • 4.2: North American Metal Sputtering Target Material Market
    • 4.2.1: North American Metal Sputtering Target Material Market by Type: Pure Metal and Alloy 4.2.2: North American Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.3: European Metal Sputtering Target Material Market
    • 4.3.1: European Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.3.2: European Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.4: APAC Metal Sputtering Target Material Market
    • 4.4.1: APAC Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.4.2: APAC Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display
  • 4.5: ROW Metal Sputtering Target Material Market
    • 4.5.1: ROW Metal Sputtering Target Material Market by Type: Pure Metal and Alloy
    • 4.5.2: ROW Metal Sputtering Target Material Market by Application: Semiconductor, Solar Energy, and Flat Panel Display

5. Competitor Analysis

  • 5.1: Product Portfolio Analysis
  • 5.2: Operational Integration
  • 5.3: Porter's Five Forces Analysis

6. Growth Opportunities and Strategic Analysis

  • 6.1: Growth Opportunity Analysis
    • 6.1.1: Growth Opportunities for the Global Metal Sputtering Target Material Market by Type
    • 6.1.2: Growth Opportunities for the Global Metal Sputtering Target Material Market by Application
    • 6.1.3: Growth Opportunities for the Global Metal Sputtering Target Material Market by Region
  • 6.2: Emerging Trends in the Global Metal Sputtering Target Material Market
  • 6.3: Strategic Analysis
    • 6.3.1: New Product Development
    • 6.3.2: Capacity Expansion of the Global Metal Sputtering Target Material Market
    • 6.3.3: Mergers, Acquisitions, and Joint Ventures in the Global Metal Sputtering Target Material Market
    • 6.3.4: Certification and Licensing

7. Company Profiles of Leading Players

  • 7.1: JX Nippon Mining & Metals
  • 7.2: Praxair
    • 7.1.1: Plansee
  • 7.4: Mitsui Mining & Smelting
  • 7.5: Hitachi Metals
  • 7.6: Honeywell
  • 7.7: Sumitomo Chemical
  • 7.8: ULVAC
  • 7.9: Materion
  • 7.10: GRIKIN Advanced Material