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市場調查報告書
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1616427

化學機器平坦化市場:各地區,2024年~2031年

Chemical Mechanical Planarization Market by Type, Technology, Application, Distribution Channel & Region for 2024-2031

出版日期: | 出版商: Verified Market Research | 英文 202 Pages | 商品交期: 2-3個工作天內

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簡介目錄

2024-2031年化工機械扁平化市場評估

化學機械平化(CMP)市場是半導體製造實現晶圓表面精密平坦化的重要市場。 CMP 使用化學和機械技術來平滑半導體表面,從而提高裝置性能和可靠性。該市場是由半導體技術的進步以及對更小、更有效率的設備不斷增長的需求所推動的。因此,預計2023年市場規模將超過65億美元,2031年將達到111.1億美元。

由於對半導體製造和創新的大量投資,北美和亞太地區在 CMP 市場佔據主導地位。主要公司包括應用材料公司、卡博特微電子公司和荏原公司。隨著人工智慧和 5G 等即將到來的技術的出現,半導體產業不斷擴大和發展,市場可能會成長。化學機械平坦化需求的持續成長使市場從 2024 年到 2031 年的複合年增長率為 7.8%。

化學機械扁平化市場定義/概述

化學機械平坦化(CMP)是一種平滑和平坦化半導體表面的方法。化學漿料和機械拋光用於去除多餘的材料並形成先進積體電路結構和最大元件性能所需的均勻層。

化學機械平坦化 (CMP) 對於半導體製造中晶圓表面的平坦化和光滑化至關重要。同時進行化學和機械工藝,以去除多餘的材料,提高均勻性,實現積體電路的精確圖案化,並實現半導體裝置的最佳性能和可靠性。

由於化學機械平坦化(CMP) 在半導體製造中的重要性,尤其是在先進節點和人工智慧晶片和物聯網設備等即將推出的技術中,化學機械平坦化(CMP) 預計將在未來增長。 CMP 將晶圓精確拋光至奈米級,從而為下一代設備帶來卓越的良率和性能。

半導體產業的成長會提振CMP市場嗎?

隨著半導體產業的崛起,CMP(化學機械平坦化)市場預計將大幅擴大。隨著通訊、汽車和消費性電子等行業對電子產品的全球需求持續成長,半導體製造商正在提高產能。推動這一成長的是 5G、人工智慧和物聯網 (IoT) 等技術創新,所有這些都需要日益複雜和高效的半導體元件。

CMP 對於半導體製造至關重要,因為它可以實現晶圓表面的精確拋光和平坦化。隨著半導體設計變得更加複雜和特徵尺寸縮小,對能夠解決這些問題的 CMP 技術的需求不斷增加。此外,半導體材料和技術的持續創新也推動了 CMP 解決方案的採用。

因此,半導體產業的成長軌跡與CMP市場的擴大直接相關,而CMP已成為提高全球半導體製造能力的重要要素。

與現代材料的有限相容性會阻礙 CMP 市場嗎?

在化學機械平坦化 (CMP) 領域,與目前材料的兼容性有限可能是一個問題。隨著半導體技術的進步,低k電介質和高性能金屬等新材料經常用於半導體製造。 CMP 程序必須繼續適應這些材料,以確保成功平坦化而不會造成損壞或污染。

CMP 漿料、拋光墊和設備的創新對於克服半導體製造中的兼容性課題,同時保持高產量和品質至關重要。投資研發以改進 CMP 技術以適應新材料的公司可以滿足產業需求。因此,如果 CMP 市場要滿足半導體製造商不斷增長的需求並保持能夠生產尖端積體電路的能力,那麼解決相容性問題至關重要。

目錄

第1章 簡介

  • 市場定義
  • 市場區隔
  • 調查手法

第2章 摘要整理

  • 主要調查結果
  • 市場概要
  • 市場亮點

第3章 市場概要

  • 市場規模與成長的可能性
  • 市場趨勢
  • 推動市場要素
  • 阻礙市場要素
  • 市場機會
  • 波特的五力分析

第4章 化學機器平坦化市場:各消耗品類型

  • 拋光泥漿
  • 墊片潤髮乳

第5章 化學機器平坦化市場:各設備類型

  • 拋光設備
  • 清洗設備

第6章 化學機器平坦化市場:各終端用戶產業

  • 半導體製造
  • 資料儲存
  • 光學及光電
  • MEMS(微電子機械系統)
  • 其他

第7章 地區分析

  • 北美
  • 美國
  • 加拿大
  • 墨西哥
  • 歐洲
  • 英國
  • 德國
  • 法國
  • 義大利
  • 亞太地區
  • 中國
  • 日本
  • 印度
  • 澳洲
  • 南美
  • 巴西
  • 阿根廷
  • 智利
  • 中東·非洲
  • 南非
  • 沙烏地阿拉伯
  • 阿拉伯聯合大公國

第8章 市場動態

  • 推動市場要素
  • 阻礙市場要素
  • 市場機會
  • COVID-19對市場的影響

第9章 競爭情形

  • 主要企業
  • 市場佔有率分析

第10章 企業簡介

  • Solai Corporation
  • Cabot Microelectronics Corporation
  • DowDuPont
  • BASF SE
  • E. I. du Pont de Nemours and Company
  • Shin-Etsu Chemical Co. , Ltd.
  • TEL Corporation
  • Air Products and Chemicals, Inc.
  • Merck KGaA
  • Entegris, Inc.

第11章 市場展望和機會

  • 新興技術
  • 今後的市場趨勢
  • 投資機會

第12章 附錄

  • 簡稱清單
  • 出處和參考文獻
簡介目錄
Product Code: 6702

Chemical Mechanical Planarization Market Valuation - 2024-2031

The Chemical Mechanical Planarization (CMP) market is critical in semiconductor manufacturing, providing precise wafer surface planarization. CMP uses chemical and mechanical methods to smooth and flatten semiconductor surfaces, improving device performance and reliability. This market is being pushed by advances in semiconductor technology and rising demand for smaller, more efficient devices. This is likely to enable the market size surpass USD 6.5 Billion valued in 2023 to reach a valuation of aroundUSD 11.11 Billion by 2031.

North America and Asia-Pacific dominate the CMP market, owing to significant investments in semiconductor manufacturing and technical innovation. Leading firms include Applied Materials, Cabot Microelectronics and Ebara Corporation. The market is likely to rise as the semiconductor industry expands and evolves with upcoming technologies such as AI and 5G. The rising demand for chemical mechanical planarization is enabling the market grow at aCAGR of 7.8% from 2024 to 2031.

Chemical Mechanical Planarization Market: Definition/ Overview

Chemical Mechanical Planarization (CMP) is a method for smoothing and flattening semiconductor surfaces. It uses a chemical slurry and mechanical polishing to remove superfluous material, resulting in uniform layers required for advanced integrated circuit construction and maximum device performance.

Chemical Mechanical Planarization (CMP) is essential in semiconductor production for producing flat and smooth wafer surfaces. It entails simultaneous chemical and mechanical processes to remove surplus material, improve homogeneity and allow for precise patterning of integrated circuits, resulting in optimal performance and reliability in semiconductor devices.

Chemical Mechanical Planarization (CMP) is positioned for future growth because to its importance in semiconductor production, particularly for advanced nodes and upcoming technologies such as AI chips and IoT devices. CMP's precise polishing of wafers to nanoscale levels provides great yields and performance in next-generation devices.

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Will Growth of the Semiconductor Industry Boost the Chemical Mechanical Planarization Market?

The rise of the semiconductor sector is expected to greatly increase the chemical mechanical planarization (CMP) market. As global demand for electronics continues to rise in industries such as telecommunications, automotive, and consumer electronics, semiconductor manufacturers are increasing production capacity. This growth is being driven by technological breakthroughs such as 5G, artificial intelligence and the Internet of Things (IoT), all of which demand increasingly sophisticated and efficient semiconductor components.

CMP is vital in semiconductor production because it ensures precise polishing and planarization of wafer surfaces, which is required for good yields and integrated circuit performance. As semiconductor designs get more sophisticated and feature sizes drop, the demand for CMP methods capable of handling these issues increases. Furthermore, continued innovation in semiconductor materials and techniques further propels the adoption of CMP solutions.

Therefore, the growth trajectory of the semiconductor industry directly correlates with the expansion of the CMP market, making CMP an integral part of advancing semiconductor manufacturing capabilities globally.

Will Limited Compatibility with Modern Materials Hamper the Chemical Mechanical Planarization Market?

Limited compatibility with current materials can present a problem to the chemical mechanical planarization (CMP) sector. As semiconductor technology advances, novel materials such as low-k dielectrics and sophisticated metals are being used more frequently in semiconductor manufacture. CMP procedures must continuously adapt to these materials in order to achieve successful planarization without producing damage or contamination.

Innovation in CMP slurries, pads, and equipment is critical for overcoming compatibility challenges while maintaining high yields and quality in semiconductor manufacturing. Companies who invest in research and development to improve CMP technology for newer materials will be better able to meet industry demands. As a result, addressing compatibility issues is critical for the CMP market to accommodate semiconductor manufacturers' increasing needs and maintain its position in enabling the creation of cutting-edge integrated circuits.

Category-Wise Acumens

Will High-Performance Computing Drive the Technology Segment?

High-performance computing (HPC) is a major driver of the leading-edge technology segment in the chemical mechanical planarization (CMP) market. HPC applications, such as AI, machine learning and data analytics require advanced semiconductor nodes (such as 7nm and down) to provide extraordinary processing power and efficiency. CMP is critical to achieve the nanoscale precision required by these sophisticated integrated circuits.

As the demand for higher computing speeds and improved data processing capabilities grows in industries such as research, finance and healthcare, so does the need for more powerful semiconductors. This trend not only fuels CMP technology innovation, but it also encourages investment in next-generation materials and processes that improve semiconductor performance. Consequently, HPC is likely to have a substantial impact on the growth and evolution of the Leading-Edge technology segment in the CMP market.

Will Widespread Use in Electronics Drive the Integrated Circuits Segment?

The extensive use of electronics drives the Integrated Circuits (ICs) segment of the chemical mechanical planarization (CMP) market. Smartphones, computers, television and automobile electronics all rely on integrated circuits (ICs). As customer demand for these items grows globally, so does the necessity for modern semiconductor manufacturing processes like as CMP to ensure the manufacture of high-performance integrated circuits.

Furthermore, emerging technologies like as 5G, IoT and AI-driven applications are increasing the complexity and performance requirements for integrated circuits. This tendency not only drives innovation in semiconductor design, but it also needs more precise and efficient production methods, such as CMP. As a result, the ICs category continues to dominate the CMP market, driven by continued developments in electronics and expanding applications that rely on sophisticated semiconductor technologies.

Country/Region Wise Acumens

Will Strong Presence of Semiconductor Manufacturing Hubs the Market in North America?

The existence of semiconductor manufacturing centers in North America has a big impact on the market. The region is home to significant firms such as Intel and AMD, as well as a strong ecosystem of semiconductor production facilities (fabs) and research institutions. These centers drive innovation and technological improvements in semiconductor manufacturing processes, such as chemical mechanical planarization (CMP).

North America benefits from significant R&D investments, giving it a competitive advantage in developing next-generation semiconductor technologies. This climate boosts demand for CMP technologies, which are critical for achieving high precision and uniformity in semiconductor wafer production. Furthermore, favourable government policies and infrastructure assistance strengthen North America's position as a key hub for semiconductor manufacturing. As a result, the region continues to play a crucial role in developing the global CMP market, with trends in technology adoption and market growth across various high-tech industries.

Will Increasing Semiconductor Production Drive the Market in Asia Pacific Region?

Increasing semiconductor output in Asia-Pacific is a major driver of the chemical mechanical planarization (CMP) market. Countries such as China, Taiwan, and South Korea are critical to global semiconductor manufacturing, having key fabs and undergoing significant technical improvement. This rise is being driven by rising demand for electronics such as smartphones, IoT devices and automotive electronics, all of which rely significantly on sophisticated semiconductor technologies.

The rise of semiconductor production capacity in Asia-Pacific increases the demand for CMP technologies to assure high yields and quality in semiconductor wafers. Furthermore, favorable government regulations, infrastructural expenditures and a competent workforce add to the region's appeal for semiconductor manufacturing. As a result, Asia-Pacific is positioning itself as the fastest-growing area in the CMP market, driving innovation and competitiveness in the global semiconductor industry.

Competitive Landscape

The chemical mechanical planarization market is a dynamic and competitive space, characterized by a diverse range of players vying for market share. These players are on the run for solidifying their presence through the adoption of strategic plans such as collaborations, mergers, acquisitions, and political support. The organizations are focusing on innovating their product line to serve the vast population in diverse regions.

Some of the prominent players operating in the chemical mechanical planarization market include:

Applied Materials, Inc., CMC Materials, Inc., Fujimi Incorporated, Hitachi Chemical Co., Ltd., Ebara Corporation, Versum Materials, Inc., DuPont Electronic Solutions, BASF SE, Lam Research Corporation, Intel Corporation, Samsung Electronics Co., Ltd.

Latest Developments

In July 2022, Entegris bought CMC Materials, Inc. to expand its range for semiconductor and fabrication applications.

In March 2022, Fujifilm Electronic Materials, U.S.A., Inc. completed a $88 million expansion of its facilities in Mesa, Arizona, USA. This expansion boosts the company's manufacturing capacity by 30%.

In February 2022, Merck Korea finished building a semiconductor CMP slurry production facility at its Pyeongtaek plant in South Korea.

TABLE OF CONTENTS

1. Introduction

  • Market Definition
  • Market Segmentation
  • Research Methodology

2. Executive Summary

  • Key Findings
  • Market Overview
  • Market Highlights

3. Market Overview

  • Market Size and Growth Potential
  • Market Trends
  • Market Drivers
  • Market Restraints
  • Market Opportunities
  • Porter's Five Forces Analysis

4. Chemical Mechanical Planarization Market, By Type of Consumables

  • Abrasive Slurries
  • Pad Conditioners

5. Chemical Mechanical Planarization Market, By Equipment Type

  • Polishing Machines
  • Cleaning Equipment

6. Chemical Mechanical Planarization Market, By End-User Industry

  • Semiconductor Manufacturing
  • Data Storage
  • Optics and Photonics
  • MEMS (Micro-Electro-Mechanical Systems)
  • Others

7. Regional Analysis

  • North America
  • United States
  • Canada
  • Mexico
  • Europe
  • United Kingdom
  • Germany
  • France
  • Italy
  • Asia-Pacific
  • China
  • Japan
  • India
  • Australia
  • Latin America
  • Brazil
  • Argentina
  • Chile
  • Middle East and Africa
  • South Africa
  • Saudi Arabia
  • UAE

8. Market Dynamics

  • Market Drivers
  • Market Restraints
  • Market Opportunities
  • Impact of COVID-19 on the Market

9. Competitive Landscape

  • Key Players
  • Market Share Analysis

10. Company Profiles

  • Solai Corporation
  • Cabot Microelectronics Corporation
  • DowDuPont
  • BASF SE
  • E. I. du Pont de Nemours and Company
  • Shin-Etsu Chemical Co. , Ltd.
  • TEL Corporation
  • Air Products and Chemicals, Inc.
  • Merck KGaA
  • Entegris, Inc.

11. Market Outlook and Opportunities

  • Emerging Technologies
  • Future Market Trends
  • Investment Opportunities

12. Appendix

  • List of Abbreviations
  • Sources and References